Nanopattern Transformation ofABC Triblock Copolymer Thin Films Induced by Strong Solvent Selectivity and Annealing  

作　　者：HUANG Hailiang ZU Xihong YI Guobin ZHONG Benbin LUO Hongsheng 

机构地区：[1]School of Chemical Engineering and Light Industry, Guangdong University of Technology, Guangzhou 510006, P. R. China

出　　处：《Chemical Research in Chinese Universities》2017年第4期684-688,共5页高等学校化学研究（英文版）

基　　金：Supported by the National Natural Science Foundations of China（Nos.51273048, 51203025） and the Natural Science Foundation of Guangdong Province, China（No.S2012040007725）.

摘　　要：Nanopattem transformation behaviors of polyisoprene-block-polystyrene-block-poly（2-vinylpyridine） （PI-b-PS-b-P2VP） asymmetric ABC triblock copolymer were investigated systematically with various control para- meters, including different solvents for polymer solution and annealing conditions in this paper. Ordered nanopattern of PI-b-PS-b-P2VP with hexagonal cylinders could be obtained when PI-b-PS-b-P2VP toluene solution was spin-coated on silicon substrate followed by toluene vapor annealing process. When the film with hexagonal and cylindrical nanopattern was exposed to saturated toluene vapor, the order-order transition of cylindrical nanopattern to parallel nanopattern was observed due to the strong selectivity of toluene to PS and PI blocks. Furthermore, fingerprint nanopattern could also be obtained by solvent annealing in tetrahydrofuran vapor. The nanopattern trans- formation was due to different selectivity of solvents and incompatibilities of the three blocks of PI-b-PS-b-P2VP under various solvent annealing conditions.Nanopattem transformation behaviors of polyisoprene-block-polystyrene-block-poly（2-vinylpyridine） （PI-b-PS-b-P2VP） asymmetric ABC triblock copolymer were investigated systematically with various control para- meters, including different solvents for polymer solution and annealing conditions in this paper. Ordered nanopattern of PI-b-PS-b-P2VP with hexagonal cylinders could be obtained when PI-b-PS-b-P2VP toluene solution was spin-coated on silicon substrate followed by toluene vapor annealing process. When the film with hexagonal and cylindrical nanopattern was exposed to saturated toluene vapor, the order-order transition of cylindrical nanopattern to parallel nanopattern was observed due to the strong selectivity of toluene to PS and PI blocks. Furthermore, fingerprint nanopattern could also be obtained by solvent annealing in tetrahydrofuran vapor. The nanopattern trans- formation was due to different selectivity of solvents and incompatibilities of the three blocks of PI-b-PS-b-P2VP under various solvent annealing conditions.

关 键 词：Triblock copolymer NANOPATTERN SELF-ASSEMBLY Solvent vapor annealing 

分 类 号：TQ320.77[化学工程—合成树脂塑料工业] O632.13[理学—高分子化学]