机构地区:[1]Department of Civil and Environmental Engineering, Hong Kong University of Science and Technology, Kowioon, Hong Kong, China [2]Hong Kong Branch of the Chinese National Engineering Research Center for Control & Treatment of Heavy Metal Pollution, Hong Kong University of Science and Technology, Kowloon, Hong Kong, China [3]School of Environmental Science and Engineering, Sun Yat-sen University, Guangzhou, China
出 处:《Journal of Environmental Sciences》2017年第8期146-154,共9页环境科学学报(英文版)
基 金:supported by the Hong Kong Research Grant Council (grant number 16208914)
摘 要:The formation of disinfection by-products(DBPs) from the degradation of N,N-diethyl-3-methyl benzoyl amide(DEET) and ibuprofen(IBP) by the ultraviolet irradiation(UV)/chlorine process and subsequent post-chlorination was investigated and compared with the UV/H_2O_2 process.The pseudo first-order rate constants of the degradation of DEET and IBP by the UV/chlorine process were 2 and 3.1 times higher than those by the UV/H_2O_2 process, respectively, under the tested conditions. This was due to the significant contributions of both reactive chlorine species U(RCS) and hydroxyl radicals(HO) in the UV/chlorine process. Trichloromethane, 1,1,1-trichloro-2-propanone and dichloroacetic acid were the major known DBPs formed after 90% of both DEET and IBP that were degraded by the UV/chlorine process. Their yields increased by over 50%after subsequent 1-day post-chlorination. The detected DBPs after the degradation of DEET and IBP comprised 13.5% and 19.8% of total organic chlorine(TOCl), respectively, and the proportions increased to 19.8% and 33.9% after subsequent chlorination, respectively. In comparison to the UV/H_2O_2 process accompanied with post-chlorination, the formation of DBPs and TOCl in the UV/chlorine process together with post-chlorination was 5%–63% higher,Ulikely due to the generation of more DBP precursors from the attack of RCS, in addition to HO.The formation of disinfection by-products(DBPs) from the degradation of N,N-diethyl-3-methyl benzoyl amide(DEET) and ibuprofen(IBP) by the ultraviolet irradiation(UV)/chlorine process and subsequent post-chlorination was investigated and compared with the UV/H_2O_2 process.The pseudo first-order rate constants of the degradation of DEET and IBP by the UV/chlorine process were 2 and 3.1 times higher than those by the UV/H_2O_2 process, respectively, under the tested conditions. This was due to the significant contributions of both reactive chlorine species U(RCS) and hydroxyl radicals(HO) in the UV/chlorine process. Trichloromethane, 1,1,1-trichloro-2-propanone and dichloroacetic acid were the major known DBPs formed after 90% of both DEET and IBP that were degraded by the UV/chlorine process. Their yields increased by over 50%after subsequent 1-day post-chlorination. The detected DBPs after the degradation of DEET and IBP comprised 13.5% and 19.8% of total organic chlorine(TOCl), respectively, and the proportions increased to 19.8% and 33.9% after subsequent chlorination, respectively. In comparison to the UV/H_2O_2 process accompanied with post-chlorination, the formation of DBPs and TOCl in the UV/chlorine process together with post-chlorination was 5%–63% higher,Ulikely due to the generation of more DBP precursors from the attack of RCS, in addition to HO.
关 键 词:Pharmaceuticals and personal care products Disinfection by-products UV/chlorine process UV/H2O2 process Chlorination
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