图形双缓冲和GDI+在多靶磁控溅射系统中的应用  

The Application of Graphic Double Buffer And GDI+ in Multiple Target Magnet Sputtering System

作　　者：陈立宁[1] 罗超[1] 林伯奇[1] 彭栋[1] 

机构地区：[1]中国电子科技集团公司第四十八研究所,湖南长沙410111

出　　处：《电子工业专用设备》2017年第4期50-55,共6页Equipment for Electronic Products Manufacturing

摘　　要：根据双缓冲的原理,利用GDI+中高级图形处理功能较高地还原磁控溅射工艺的全流程,以动画的形式实时呈现在UI界面上的全过程。双缓冲的实现使得用户在观察窗狭小的情况下,通过软件UI界面能实时浏览工艺的当前运行进度。It describes how to use the senior functions in GDI plus and animate the magnet sputtering process on UI in this dissertation. The application of double buffer in the system makes users have a real time view about the magnet sputtering process on top of the software UI without taking a bad look at the inside by a small window.

关 键 词：双缓冲 闪烁 图形设备用户接口 

分 类 号：TN305.92[电子电信—物理电子学]