基于Linnik型白光显微干涉光谱测量方法  

White Light Microscopic Spectral Interferometric Measuring Method Based on Linnik Type

作　　者：郭彤[1] 周勇[1] 李明惠[1] 吴菊红[1] 傅星[1] 胡小唐[1] 

机构地区：[1]精密测试技术及仪器国家重点实验室(天津大学),天津300072

出　　处：《纳米技术与精密工程》2017年第5期360-365,共6页Nanotechnology and Precision Engineering

基　　金：国家重点研发计划重点资助项目(2017YFF0105905)

摘　　要：针对在复杂测量环境下实现薄膜类样品的高精度测量需求,基于白光干涉光谱测量理论,搭建了Linnik型白光显微干涉光谱测量系统,该系统具有较长的工作距离.系统采用5步相移算法实现相位信息的精确提取,通过对绝对距离以及标准薄膜样品的测试,验证了方法的可行性,并在此基础上利用系统实现了对微结构表面形貌和不同材料薄膜厚度的纳米级精度测量.Regarding the requirements for high precision measurement of thin film specimens in complex conditions, a Linnik type measuring system with long working distance was built based on white light mi-croscopic spectral interferometry. Five-step phase-shifting algorithm was adopted to extract accurate phase information in the measuring system. Several experiments were conducted to measure the absolute dis-tance and standard thin film thickness, verifying the feasibility of the system. And it has been achieved that the system can measure the surface topography and thin film thickness with nanoscale accuracy.

关 键 词：Lirmik型 白光干涉光谱 薄膜 非线性相位修正 

分 类 号：O657.3[理学—分析化学]