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作 者:曹歆昕[1] 李吉丹[1] 张晶 魏翀[1] 陈伟[1] 范成荣
机构地区:[1]首都航天机械公司,北京100076
出 处:《电镀与精饰》2017年第9期38-41,共4页Plating & Finishing
摘 要:采用正交试验分析了2A12铝合金硬质阳极氧化的工艺参数,研究了电流密度、硬质阳极氧化时间及硫酸浓度对膜层显微硬度及厚度的影响规律。结果表明,电流密度对硬质阳极氧化膜厚度影响相对较大,硫酸质量浓度对硬质阳极氧化膜的显微硬度的影响显著。最佳的氧化工艺参数为:电流密度3.0 A/dm^2,氧化时间t为70 min,硫酸质量浓度240 g/L。该工艺参数下得到的硬质氧化膜平均硬度可达352 HV,膜层厚度δ可达60μm,膜层致密,厚度均匀,综合性能优异。Process parameters of 2A12 aluminum alloy hard anodic oxidation were optimized through orthogonal experiment. The effects of current density,oxidation time and sulfuric acid concentration on oxidation film thickness and micro-hardness were studied respectively. The result showed that the current density had the great effect on the thickness of the oxide film. The sulfuric acid had the great effect on the hardness of the oxide film. The optimal technological parameter for oxidation was as follows: current density was 3. 0 A/dm2,oxidation time was 70 min,sulfuric acid concentration was 240 g/L. Under these process conditions,the average hardness of generated film can reach 352 HV,the thickness of film can reach 60 μm,the film is dense and with uniform thickness. The comprehensive performance of the oxide film is excellent.
分 类 号:TG174.451[金属学及工艺—金属表面处理]
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