Electropolishing technique of Hastelloy C-276 alloy  被引量:3

Electropolishing technique of Hastelloy C-276 alloy

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作  者:Qiang Jia Yi Wang Hong-Li Suo Pan Wang Meng-Yuan Li Qian-Yu Huo 

机构地区:[1]School of Materials Science and Engineering,Beijing Universityof Technology,Beijing 100022,China

出  处:《Rare Metals》2017年第8期635-639,共5页稀有金属(英文版)

基  金:financially supported by the National Science Foundation of China(Nos.51571002,51171002 and 51401003);Beijing Municipal Natural Science Foundations(Nos.2132011 and KZ201310005003)

摘  要:Preparing a highly textured,flawless YBa_(2-)Cu_3O_7(YBCO)layer by ion-beam-as sis ted deposition(IBAD)requires a substrate with a smooth surface.In this paper,smooth tapes of Hastelloy C-276,a common template alloy,were prepared by electrochemical polishing,and the surface roughness the tapes was investigating by atomic force microscopy and scanning electron microscopy.By analyzing these results,it was discussed how the processing parameters affect the surface roughness,and it is found the following optimized processing parameters:current density of 0.104 A·cm^(-2),temperature of 50℃,plate spacing of 9 cm and time of 150 s.With these optimized parameters,the substrate roughness decreases to less than 5 nm,meeting the requirements of IBAD.Preparing a highly textured,flawless YBa_(2-)Cu_3O_7(YBCO)layer by ion-beam-as sis ted deposition(IBAD)requires a substrate with a smooth surface.In this paper,smooth tapes of Hastelloy C-276,a common template alloy,were prepared by electrochemical polishing,and the surface roughness the tapes was investigating by atomic force microscopy and scanning electron microscopy.By analyzing these results,it was discussed how the processing parameters affect the surface roughness,and it is found the following optimized processing parameters:current density of 0.104 A·cm^(-2),temperature of 50℃,plate spacing of 9 cm and time of 150 s.With these optimized parameters,the substrate roughness decreases to less than 5 nm,meeting the requirements of IBAD.

关 键 词:Hastelloy C-276 Electro-chemical polishing Atomic force microscopy Current density 

分 类 号:TG580.692[金属学及工艺—金属切削加工及机床]

 

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