薄膜元件基底断点划痕的激光辐照效应  

Laser irradiation effects of non-continuous scratch on substrate of thin film optical device

作　　者：章春来[1] 姚春梅 

机构地区：[1]西南民族大学电气信息工程学院,成都610041 [2]西南民族大学药学院,成都610041

出　　处：《中国科学：技术科学》2017年第9期972-976,共5页Scientia Sinica(Technologica)

基　　金：西南民族大学中央高校基本科研业务费专项资金(编号:2017NZYQN25)资助项目

摘　　要：建立了断点划痕的正棱锥模型,在355 nm激光辐照下,用三维时域有限差分法研究了熔石英后表面具有不同棱角的断点划痕对场分布的调制作用.结果表明,电场强区分布在棱边一侧,深度在亚表面层2λ内.相同情况下,边边相对,比角角相对和边角相对具有更大的调制强度.随着棱角数目的增多,需要更大的坑点间距才能获得调制最大值.研究表明这类划痕诱导的最大电场幅值为入射波的3.70倍,可采用酸蚀或者CO_2激光辐照钝化棱角的方法来减小调制.The pyramid model of non-continuous scratch was established. Under the irradiation of 355 nm laser, 3D finite-difference time-domain method was used to simulate the light intensity enhancement of such scratches on the output subsurface of fused silica. Results show that the strongest electricfield is distributed on the edge side and its depth is inside 2λ sub-surface. In the same case, the edge and edge relative has the greatest modulation of all. As the corner number increases, it requires a larger gap to achieve the peak modulation.Results show that the maximum electric field amplitude of these scratches is 3.70 times of that of the incident laser. We can use passivation methods to reduce the modulation, such as HF etching or CO2 laser irradiation.

关 键 词：高功率激光 划痕 激光辐照 时域有限差分 

分 类 号：TN249[电子电信—物理电子学]