光栅刻划机阿贝误差对光栅衍射波前质量的影响及其校正方法  

Influence and Revising Method of Grating Ruling Engine′s Abbe Error on Quality of Grating Wavefront

作　　者：糜小涛[1,2] 于海利 于宏柱[1] 齐向东[1] 李晓天[1] 万秋华[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所,吉林长春130033 [2]中国科学院大学,北京100049

出　　处：《中国激光》2017年第9期142-150,共9页Chinese Journal of Lasers

基　　金：国家973计划(2014CB049500);国家自然科学基金(61605204);重大科学仪器设备开发专项(2016YFF0103304)

摘　　要：衍射波前质量是衡量刻划光栅性能的重要指标之一,光栅刻划机若存在阿贝误差,将直接影响刻线位置精度,从而影响光栅的波前质量。建立了刻划机阿贝误差与光栅衍射波前质量的物理模型,并分析了该误差对波前质量的影响。针对该误差设计了一种基于双频激光干涉测量的阿贝误差测量光路,测量了刻划机的阿贝误差,根据物理模型对其导致的光栅衍射波前误差作了仿真分析,并提出了基于双层工作台结构的误差控制校正方法。对两块尺寸为80mm×100mm、刻线密度为79groove/mm的中阶梯光栅进行了阿贝误差校正前后的对比刻划实验。结果表明,通过对阿贝误差的测量和校正,光栅闪耀级次为-36级的衍射波前误差由0.529λ降低至0.159λ(λ=632.8nm),有效地降低了阿贝误差对光栅衍射波前质量的影响。Diffracted wavefront quality is one of the important performance indexes of gratings. If there is Abbe error in the grating ruling engine, it will directly affect the positioning accuracy of grooves, thus affecting wavdront quality of gratings. The physical models of the Abbe error and the quality of the grating diffraction wave are established, to analyze the influence of the error on the wavefront quality. Aiming at the Abbe error, a kind of measurement optical path is designed based on dual-frequency laser interferometry, and the influence of Abbe error on diffracted wavefront of the grating is measured and simulated. Furthermore, the error control method based on double-layer grating table structure is proposed. Before and after revising Abbe error, the ruling experiments for two echelle gratings with the size of 80 mm × 100 mm and groove density of 79 groove/mm are carried out. The results show that the diffracted wavefront error of the gratings in -36 blaze order is reduced from 0. 529λ to 0. 159λ （λ=632.8 nm） by the measurement and correction of the Abbe error, which effectively reduces the influence of Abhe error on the quality of grating＇s diffracted wavefront.

关 键 词：衍射光栅 阿贝误差 衍射波前 刻线位置误差 刻划机 

分 类 号：TH113.2[机械工程—机械设计及理论]