溅射功率对Zn_(1-x)Mg_xO薄膜性能的影响  

Influence of sputtering power on the properties of Zn_(1-x)Mg_xO films prepared by RF magnetron sputtering

作　　者：王怡[1] 李合增[1] 赵昶[1] 邢光建[1] 李东临[1] 郭瑞[1] 马海玲[2] 

机构地区：[1]北京石油化工学院数理系,北京102617 [2]沈阳真空技术研究所,辽宁沈阳110042

出　　处：《真空》2017年第5期31-34,共4页Vacuum

摘　　要：用射频磁控溅射制备Zn_(1-x)Mg_xO薄膜,通过对不同溅射功率制备的薄膜结构和薄膜的室温透射谱和光致发光光谱的分析,得到溅射功率对薄膜结构和形貌的和光学性能的影响。The Zn1-xMgxO films were prepared by RF magnetron sputtering under different sputtering power. The influence of sputtering power on transmission and Photoluminescence Spectroscopy of Zn1 -xMgxO films was studied. The Optimization parameters of Zn1-xMgxO films were obtained.

关 键 词：射频磁控溅射 Zn1-xMgxO薄膜 透射谱 光致发光谱 

分 类 号：O614.41[理学—无机化学] TB43[理学—化学]