Design of a grating by a joint optimization method for a phase-shifting point diffraction interferometer  

Design of a grating by a joint optimization method for a phase-shifting point diffraction interferometer

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作  者:Meng Zheng Ke Liu Lihui Liu and Yanqiu Li 郑猛;刘克;刘丽辉;李艳秋(Key Laboratory of Photoelectronic Imaging Technology and Systems,Ministry of Education of China,School of Optoelectronics,Beijing Institute of Technology)

机构地区:Key Laboratory of Photoelectronic Imaging Technology and Systems,Ministry of Education of China,School of Optoelectronics,Beijing Institute of Technology,Beijing 100081,China

出  处:《Chinese Optics Letters》2017年第10期66-70,共5页中国光学快报(英文版)

基  金:supported by the Major Scientific Instrument Development Project of the National Natural Science Foundation of China(No.11627808);the National Natural Science Foundation of China(No.61675026);the National Science and Technology

摘  要:A grating is an important element of a phase-shifting point diffraction interferometer, and the grating constant and duty cycle have a great impact on the interferometer, so the design of a grating becomes significant. In order to measure the projection objective with a numerical aperture of 0.2, we present a joint optimization method of a pinhole and grating based on scalar diffraction and the finite difference time domain method. The grating constant and the film thickness are selected, and the duty cycle of the grating is optimized. The results show that in the grating processing the material chromium is adopted, the thickness is 200 nm, and the grating constant is 15 μm. When the duty cycle is 55%, the interference fringe contrast is the greatest. The feasibility of the design result is further verified by experiment.A grating is an important element of a phase-shifting point diffraction interferometer, and the grating constant and duty cycle have a great impact on the interferometer, so the design of a grating becomes significant. In order to measure the projection objective with a numerical aperture of 0.2, we present a joint optimization method of a pinhole and grating based on scalar diffraction and the finite difference time domain method. The grating constant and the film thickness are selected, and the duty cycle of the grating is optimized. The results show that in the grating processing the material chromium is adopted, the thickness is 200 nm, and the grating constant is 15 μm. When the duty cycle is 55%, the interference fringe contrast is the greatest. The feasibility of the design result is further verified by experiment.

关 键 词:exp Design of a grating by a joint optimization method for a phase-shifting point diffraction interferometer 

分 类 号:TH744.3[机械工程—光学工程]

 

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