Evaporation of a nanodroplet on a rough substrate  

作　　者：Yong-Juan Sun Tao Huang Jun-Feng Zhao Yong Chen 孙永娟;黄韬;赵俊锋;陈勇(Center of Soft Matter Physics and its Applications, Beihang University, Beijing 100191, China;Institute of Theoretical Physics, Lanzhou University, Lanzhou 730000, China;School of Physics and Nuclear Energy Engineering, Beihang University, Beijing 100191, China)

机构地区：[1]Center of Soft Matter Physics and its Applications, Beihang University, Beijing 100191, China [2]Institute of Theoretical Physics, Lanzhou University, Lanzhou 730000, China [3]School of Physics and Nuclear Energy Engineering, Beihang University, Beijing 100191, China

出　　处：《Frontiers of physics》2017年第5期191-197,共7页物理学前沿（英文版）

基　　金：Acknowledgements This work was supported by the National Natural Science Foundation of China under Grant No. 11275084 and Grant No. 21434001.

摘　　要：The wettability and roughness of a substrate are crucial to the evolution of the contact angle and three-phase contact line in the evaporation of sessile droplets. In this paper, by performing moleoilar dynamics simulations for droplet evaporation at the nanoscale, we show that the wettability is more important than the roughness. For a smooth substrate, the evaporation behavior of a nanodroplet is similar to that at the macroscopic scale. This similarity is also observed in the case of a rough hydrophilic substrate. However, for a rough hydrophobic substrate, both the constant contact angle and contact line pinning appear in turn during evaporation. This suggests that the roughness of the hydrophobic substrate is useful for the evaporation technique in self-assembly at the nanoscale.The wettability and roughness of a substrate are crucial to the evolution of the contact angle and three-phase contact line in the evaporation of sessile droplets. In this paper, by performing moleoilar dynamics simulations for droplet evaporation at the nanoscale, we show that the wettability is more important than the roughness. For a smooth substrate, the evaporation behavior of a nanodroplet is similar to that at the macroscopic scale. This similarity is also observed in the case of a rough hydrophilic substrate. However, for a rough hydrophobic substrate, both the constant contact angle and contact line pinning appear in turn during evaporation. This suggests that the roughness of the hydrophobic substrate is useful for the evaporation technique in self-assembly at the nanoscale.

关 键 词：EVAPORATION NANODROPLET ROUGHNESS WETTABILITY 

分 类 号：TQ028.61[化学工程] TG84[金属学及工艺—公差测量技术]