TiN/CrN多层薄膜的微观结构与力学性能（英文）  

Microstructures and Mechanical Properties of TiN/CrN Multilayer Films

作　　者：靳巧玲 王海斗[2] 李国禄[1] 张建军[1] 刘金娜[2,3] 

机构地区：[1]河北工业大学,天津300130 [2]装甲兵工程学院装备再制造技术国防科技重点实验室.北京100072 [3]哈尔滨工程大学,黑龙江哈尔滨150001

出　　处：《稀有金属材料与工程》2017年第10期2857-2862,共6页Rare Metal Materials and Engineering

基　　金：National Nature Science Foundation of China(51535011,51275151);National Key Basic Research Development Program of China(“973”Project)(61328304)

摘　　要：为了研究TiN/CrN多层薄膜微观结构与力学性能的关系,采用磁控溅射技术制备了TiN、CrN单层薄膜和3种不同调制周期的TiN/CrN多层薄膜。通过原子力显微镜和X射线衍射仪分析了膜的表面形貌和相结构。使用纳米压痕仪测试薄膜的硬度和压入塑性,用曲率法测定薄膜的残余应力。结果表明,TiN/CrN的多层薄膜是由TiN和Cr_2N两相组成,随着调制周期的增大,TiN层与CrN层之间的界面区域变小,界面平滑且明显。力学性能方面,多层薄膜的硬度和压入塑性比单层膜好,并且多层薄膜随调制周期的减小,硬度和压入塑性增大,残余应力随周期的增加而逐渐增大。综上可见,TiN/CrN多层薄膜的力学性能的改善取决于界面区域的大小和形貌,即调制周期。该结论与Hall-Petch理论相吻合。In order to study the relationship between mechanical properties and microstructure of TiN/CrN multilayer coatings, the TiN, CrN film and three TiN/CrN multilayer films with different periodicities were prepared on monocrystalline silicon by magnetron sputtering. Atomic force microscope and X-ray diffraction were adopted to analyze the surface morphology and phase constitution of the films, respectively. The hardness and indentation plasticity were studied using nanoindenter. Residual stress was measured by a curvature method. The results show that TiN/CrN multilayer films exhibit a mixture of TiN and Cr_2N phases, the interface zone between TiN layer and CrN layer becomes small and sharp with the increasing of periodicity. Hardness and indentation plasticity of multilayer films are better than those of monolayer films, and increase as the bilayer period decreases. For multilayer films, the residual stress increases gradually with the increasing of periodicity. From the above observation, it can be concluded that the improvement in mechanical property depends on minor periodicity. The results agree well with Hall-Petch theory.

关 键 词：TiN/CrN多层薄膜 显微结构 力学性能 调制周期 残余应力 

分 类 号：TB383.2[一般工业技术—材料科学与工程]