基体偏压对反应共溅射TiN/Ni纳米复合膜力学性能的影响  

Effect of Bias Voltage on Mechanical Properties of Reactive Magnetron Co-Sputtered TiN/Ni Nanocomposite Films

作　　者：贺春林[1] 陈宏志 高建君[1] 王苓飞 马国峰[1] 王建明[1] 

机构地区：[1]沈阳大学辽宁省先进材料制备技术重点实验室,辽宁沈阳110044

出　　处：《沈阳大学学报（自然科学版）》2017年第6期431-434,共4页Journal of Shenyang University：Natural Science

基　　金：国家自然科学基金资助项目(51171118);辽宁省高等学校优秀人才支持计划(LR2013054)

摘　　要：以高纯Ti和Ni为靶材,在不同偏压下利用反应磁控共溅射法制备了TiN/Ni纳米复合膜,采用X射线衍射、纳米压痕和划痕试验研究了偏压对复合膜相结构和力学性能的影响.结果显示,反应共溅射TiN/Ni纳米复合膜由fcc-TiN和Ni组成,其择优取向与偏压有关.随负偏压增加,复合膜晶粒尺寸逐渐减小,硬度、弹性模量、H/E、H^3/E^2和膜基结合力则先增加后下降.在偏压为-80V时所沉积的复合膜具有最好的力学性能,其硬度为(19.2±0.4)GPa、弹性模量为(311.0±5.0)GPa、H/E为0.062、H^3/E^2为0.073GPa,膜基结合力为45N.BTiN/Ni nanocomposite films have been deposited under different bias voltage by reactive magnetron co-sputtering of Ti and Ni targets in N_2 gas atmosphere,and the influence of substrate bias voltage on the phase structure and mechanical properties was investigated by X-ray diffraction,nanoindenter and scratch tests.The TiN/Ni films are composed of fcc TiN and Ni,and their preferential orientations strongly depend on bias voltage.When the bias voltage increases,the grain sizes are reduced whereas H,E,H/E,H^3/E^2 and adhesion strength are first improved and then decreased.The highest values of H,E,H/E,H^3/E^2 and adhesion strength are all presented at-80 V,which are（19.2±0.4）GPa,（311.0±5.0）GPa,0.062,0.073 GPa and 45 N,respectively.

关 键 词：TiN/Ni 纳米复合膜 反应磁控共溅射 负偏压 力学性能 

分 类 号：TB79[一般工业技术—真空技术] TB34