Ni、S单掺杂及共掺杂TiO_2薄膜的制备及光生阴极保护性能研究  

Preparation of Ni,S single doped and co doped TiO_2 thin films and study on the protective properties of the photo cathode

作　　者：李海莹 刘峥[1,2] 李庆伟 黄秋梅[1,2] 张淑芬 

机构地区：[1]广西电磁化学功能物质重点实验室,广西桂林541004 [2]桂林理工大学化学与生物工程学院,广西桂林541004

出　　处：《功能材料》2017年第11期11113-11120,11126,共9页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(21266006);广西自然科学基金资助项目(2016GXNSFAA380109)

摘　　要：将离子掺杂TiO_2涂层方法和耦合另外一种具有电子储存能力的半导体氧化物方法相结合,在碳钢/Ni-P-SnO_2、碳钢/Ni-P-WO_3表面制备Ni、S掺杂TiO_2涂层,在可见光条件下,对碳钢进行光生阴极保护作用的研究。首先在不锈钢基体上制备不同摩尔比的Ni、S掺杂及其共掺杂薄膜,通过光电测试,最佳提拉层数为3层、Ni、S最佳掺杂摩尔比分别是0.001,0.005。在此基础上,利用镀膜提拉技术,在碳钢/Ni-P-SnO_2、碳钢/Ni-PWO_3表面制备Ni、S掺杂TiO_2涂层,并对其进行SEM、XRD等表征,研究其对碳钢光生阴极保护作用,结果发现Ni、S最佳掺杂摩尔比及其最佳Ni、S共掺杂摩尔比呈现了最好的光生阴极保护性能。The ion doped TiO2 coating method is combined with another semiconductor oxide method with electronic storage capacity to make Ni and/or S doped TiO2 coatings on carbon steel/Ni-P-SnO2 and carbon steel/Ni-P-WO3 surface.Under the visible light,the photo cathode protective effect of the as-made coatings on the carbon steel was studied.Firstly,Ni or S single doped and Ni-S co-doped films with different molar ratios were prepared on stainless steel substrate.The XRD analysis and photoelectric test have revealed that the optimum sintering temperature was 400 ℃,the optimum number of layers was 3,and the best molar ratios of Ni and S doping were 0.001 and 0.005.Ni and S doped TiO2 coatings were also prepared on the surface of carbon steel/NiP-SnO2 and carbon steel/Ni-P-WO3 by film coating technique.Semiconductor SnO2（WO3）with electron storage capacity was introduced,and the protective effect was studied by SEM and XRD.It has been found that the best doping molar ratio of Ni and S and the best co-doping molar ratio of Ni-S showed the best photo cathode protection capability.

关 键 词：光生阴极保护 TIO2 溶胶凝胶法 掺杂薄膜 碳钢 

分 类 号：O646[理学—物理化学]