基于氧化镍模板Ni/Al-LDHs/Ni薄膜的制备及其性能研究  

Synthesis and properties of Ni/Al-LDHs/Ni film by electrochemical oxidation of nickel template

作　　者：杜宝中[1] 张倩岚 王妙娟 

机构地区：[1]西安理工大学应用化学系,西安710048

出　　处：《功能材料》2017年第11期11187-11191,共5页Journal of Functional Materials

基　　金：西安市工业科技攻关项目(YF07058)

摘　　要：采用电化学阳极氧化镍模板和铝片分别提供Ni^(2+)和Al^(3+),在NH_4NO_3溶液中原位生长法制备了Ni/Al-NO_3-LDHs/Ni薄膜,在弱碱性条件下,通过离子交换将对甲苯磺酸阴离子引入Ni/Al-NO_3-LDHs/Ni薄膜层间,制备了对甲苯磺酸/LDHs/Ni复合薄膜,优化了工艺条件;并借助XRD、FT-IR、SEM等手段对薄膜进行了结构和形貌分析。结果表明,对甲苯磺酸阴离子成功插层于LDHs/Ni薄膜层间,层间距由0.701nm增大至1.216nm,NO_3^-离子在1 384cm^(-1)的特征峰消失,同时出现了对甲苯磺酸阴离子的特征峰。SEM显示,LDHs晶片垂直于Ni基底生长。电化学腐蚀和UV-Vis分析表明,LDHs/Ni薄膜具有良好的耐蚀性和优异的紫外阻隔性能。Ni2＋ and Al3＋ were respectively prepared by electrochemical anodic oxidation of nickel oxide template and aluminum sheet,and Ni/Al-NO3-LDHs/Ni film was prepared by in-situ growth in NH4NO3 solution.Ptoluene sulfonic acid/LDHs composite films were prepared by introducing p-toluene sulfonic anions into the Ni/Al-NO3-LDHs/Ni layers with ion exchange method in weak alkaline conditions.The process conditions were optimized.The structure and morphology of the film were characterized by XRD,FT-IR and SEM.The results showed that p-toluene sulfonic anions were successfully intercalated into LDHs layers with the layer spacing increased from 0.701 to 1.216 nm.The characteristic peak of NO3- ion at 1 384 cm-1 disappeared while a new peak for p-toluene sulfonic anion appeared.SEM images showed that LDHs film grown vertically on Ni substrate.Electrochemical corrosion and UV-Vis analysis showed that LDHs/Ni film had good corrosion resistance and excellent UV blocking properties.

关 键 词：电化学氧化 原位合成 Ni/Al-LDHs/Ni薄膜 插层Ni/Al-LDHs/Ni薄膜 性能 

分 类 号：TQ133.1[化学工程—无机化工] TQ138.13