双压电片镜在同步辐射光源光学系统中的应用  

Application of bimorph mirror in the optical system of synchrotron radiation light source

作　　者：金利民[1] 罗红心[1] 王劼[1] 王纳秀[1] 徐中民[1] 

机构地区：[1]中国科学院上海应用物理研究所张江园区,上海201204

出　　处：《中国光学》2017年第6期699-707,共9页Chinese Optics

基　　金：国家自然科学基金资助项目(No.11175243)~~

摘　　要：介绍了双压电片镜自适应光学技术,同时为其在同步辐射光学领域中的应用与进一步发展提供前瞻性的思考与探索。根据目前已公开发表的相关文献资料,总结介绍了双压电片镜自适应光学技术,阐述了该技术的工作机理与关键参数,并对其在国际上具有代表性的同步辐射机构中的应用情况作出描述,并指出涉及的关键技术问题与未来的发展趋势:不仅要有效地解决"连接点效应"对双压电片镜技术的负面影响,还要实现亚微米乃至纳米级的聚焦光斑,这两项内容都是双压电片镜技术需要进一步解决的重要问题。未来,双压电片镜自适应光学技术可望在我国先进的第三代同步辐射装置—"上海光源(Shanghai Synchrotron Radiation Facility,SSRF)"二期工程建设中得到应用。In this paper,the adaptive optics technology of bimorph mirror(BM) is introduced,and its application and further development in the field of synchrotron radiation are prospected.Based on the existing published literatures,this paper summarizes the adaptive optics technology of the BM,introduces the working mechanism and key parameters of the technology,and describes its application in internationally representative synchrotron radiation units,and points out the key technical issues involved and future trends.It is found that not only to solve the negative effect of so-called "junction effect" on the technology of BM,but also to produce sub-micrometer and even nanometer sized focal spots,both are the critical issues for the future development of the proposed BM technique.This adaptive optics technique is expected to be used in the phase II construction of the advanced third generation synchrotron radiation light source in China,i.e.,Shanghai Synchrotron Radiation Facility(SSRF).

关 键 词：自适应光学 双压电 面形精度 同步辐射 

分 类 号：O434[机械工程—光学工程]