Ar/NH_3混合气体放电等离子体研究进展  被引量:1

Progress of Ar/NH_3 Mixture Discharge Plasma

在线阅读下载全文

作  者:李艳琴[1] 张秀玲[1] Li Yanqin;Zhang Xiuling(College of Physical Science and Technology ,Dalian University,Dalian 116622, China)

机构地区:[1]大连大学物理科学与技术学院,大连116622

出  处:《真空科学与技术学报》2017年第11期1091-1101,共11页Chinese Journal of Vacuum Science and Technology

基  金:国家自然科学基金项目(11605020;21673026;21173028);辽宁省自然科学基金项目(2015020585)

摘  要:低气压和大气压下Ar/NH_3放电等离子体的研究进展,主要包括实验装置、产生条件、检测手段及应用等,分析了NH_3的引入对等离子体性能及粒子种类的影响规律,最后展望了Ar/NH_3等离子体研究的未来发展趋势。Ar/NH_3混合气体放电等离子体由于含有NH^+、NH_2^+、NH_3^+、NH_2、NH、N、H等活性离子和激发态中性粒子,使其具有许多独特的性能,在便携式H_2发生器、ε-Fe_3N磁性液体合成、SiN_x薄膜制备、碳纳米管改性、环境保护等方面都有较广泛的应用。The latest advance ofthe hotly studied Ar/NH3 mixture discharge plasma,generated at a low and/or atmospheric pressure and compressing quite a few radicals and excited-state neutral particles,such as NH^+,NH2^+,NH3^+,NH2,NH,N,Ar^+ and H,was tentatively reviewed. The discussions,with specific examples reported in literature,focused on: i) the generation techniques and property diagnosis methods of Ar/NH3 plasma; ii) the possible mechanisms responsible for the decomposition,excitation,ionization and formation of different particles involved;iii) the potential applications of the Ar/NH3 plasma,including but not limited to the generation of hydrogen with portable devices,synthesis of ε-Fe3N ferrofluid,deposition of Si Nxthin films,modification of carbon nanotubes,removal of toxic NOx pollutantin environmental protection. In addition,the development trends,technical problems and possible solutions were also briefly discussed in a though provoking way.

关 键 词:低气压等离子体 大气压等离子体 AR NH3 

分 类 号:O539[理学—等离子体物理] O461.21[理学—物理]

 

参考文献:

正在载入数据...

 

二级参考文献:

正在载入数据...

 

耦合文献:

正在载入数据...

 

引证文献:

正在载入数据...

 

二级引证文献:

正在载入数据...

 

同被引文献:

正在载入数据...

 

相关期刊文献:

正在载入数据...

相关的主题
相关的作者对象
相关的机构对象