Effects of Three Typical Resistivity Models on Pulsed Inductive Plasma Acceleration Modeling  

作　　者：孙新锋 贾艳辉 张天平 吴宸辰 温晓东 郭宁 金海 柯于俊 郭伟龙 

机构地区：[1]National Key Laboratory of Science and Technology on Vacuum Technology and Physics,Lanzhou Institute of Physics [2]College of Electrical and Information Engineering, Lanzhou University of Technology

出　　处：《Chinese Physics Letters》2017年第12期46-50,共5页中国物理快报（英文版）

基　　金：Supported by the Fund of Science and Technology on Vacuum Technology and Physics Laboratory of Lanzhou Institute of Physics under Grant No YSC0715;the National Natural Science Foundation of China under Grant No 62601210;the Civil Aerospace Technology Research Project under Grant No D010509

摘　　要：The effects of three different typical resistivity models（Spitzer, Z＆L and M＆G） on the performance of pulsed inductive acceleration plasma are studied. Numerical results show that their influences decrease with the increase of the plasma temperature. The significant discriminations among them appear at the plasma temperature lower than 2.5 eV, and the maximum gap of the pulsed inductive plasma accelerated efficiency is approximately 2.5%.Moreover, the pulsed inductive plasma accelerated efficiency is absolutely related to the dynamic impedance parameters, such as voltage, inductance, capacitance and flow rate. However, the distribution of the efficiency as a function of plasma temperature with three resistivity models has nothing to do with the dynamic impedance parameter.The effects of three different typical resistivity models（Spitzer, Z＆L and M＆G） on the performance of pulsed inductive acceleration plasma are studied. Numerical results show that their influences decrease with the increase of the plasma temperature. The significant discriminations among them appear at the plasma temperature lower than 2.5 eV, and the maximum gap of the pulsed inductive plasma accelerated efficiency is approximately 2.5%.Moreover, the pulsed inductive plasma accelerated efficiency is absolutely related to the dynamic impedance parameters, such as voltage, inductance, capacitance and flow rate. However, the distribution of the efficiency as a function of plasma temperature with three resistivity models has nothing to do with the dynamic impedance parameter.

关 键 词：In Effects of Three Typical Resistivity Models on Pulsed Inductive Plasma Acceleration Modeling 

分 类 号：O53[理学—等离子体物理]