低温等离子体促进水稻种子生长效应及NIR光谱分析  

Effect of low-temperature plasma treatment on brown rice seed's growth vigor and analysis via near-infrared spectroscopy

作　　者：王纯阳[1,2] 万良淏 马玉涵 黄青[1,2] 

机构地区：[1]中国科学院合肥物质科学研究院技术生物与农业工程研究所,安徽合肥230031 [2]中国科学技术大学国家同步辐射实验室,安徽合肥230026 [3]南京苏曼等离子科技有限公司,江苏南京210007

出　　处：《安徽大学学报（自然科学版）》2018年第1期94-99,共6页Journal of Anhui University(Natural Science Edition)

基　　金：中国科学院战略先导项目(XDA08040107);国家自然科学基金重点资助项目(11635013)

摘　　要：使用亚大气压下介质阻挡放电低温等离子体,对水稻糙米种子进行处理,不同气体、功率、处理时间下观测低温等离子体对糙米生长活力的影响;采用近红外光谱技术对处理后的糙米进行初步的理化性质分析.结果显示:空气等离子体放电对糙米生长活力的促进要优于氮气等离子体放电,空气实验组的最佳处理条件为(360W,5min),而氮气实验组的最佳处理条件为(360W,10min).另外,近红外光谱的主成分分析结果显示空气实验组(360W,5min)和氮气实验组(360W,10min)的糙米光谱与对照组光谱均存在明显差异.低温等离子体对水稻糙米种子的生长活力具有促进作用,能利用近红外光谱技术对作用效果进行初步评估.In this work, we initiated the investigation of the effect of non-thermal low- temperature plasma on brown rice, recording the changes of rice early growth vigor under different plasma treatment conditions, i.e., different gases, discharge powers and treatment time; and furthermore, we attempted to analyze the changes of physicochemical properties for the plasma-treated brown rice based on near infrared （NIR） spectroscopy for qualitative assessment. The germination test showed that seeds treated with air-plasma had better promotion in growth vigor than the seeds treated with nitrogen-plasma; and so we obtained the optimal treatment conditions, i.e., 360 W and 5 min treatment for air-plasma, and 360 W and 10 min treatment for nitrogen-plasma, respectively. The principal component analysis （PCA） of NIR data revealed that there were obvious differences between the treated seeds such as the air （360 W, 5 min） group, the nitrogen （360 W, 10 min） group and the untreated seeds. This work therefore demonstrated that the technique of low-temperature plasma could be effectively ulilized for promotion of growth of brown rice, while the technique of NIR speclroscopy was useful for qualitative evaluation of plasma induced effects on rice seeds.

关 键 词：低温等离子体 水稻种子 种子活力 近红外光谱 主成分分析 

分 类 号：Q632[生物学—生物物理学] O433[机械工程—光学工程]