二氧化硅源对氮化反应合成氧氮化硅的影响  

The Effect of Different Silica Source on Nitriding Reaction Synthesis of Silicon Oxynitride

作　　者：聂建华[1] 姜晟[1] 文晋[1] 蔡曼菲 梁永和[1] 尹玉成[1] 

机构地区：[1]武汉科技大学省部共建耐火材料与冶金国家重点实验室,湖北武汉430081

出　　处：《陶瓷学报》2017年第6期826-830,共5页Journal of Ceramics

基　　金：省部共建耐火材料与冶金国家重点实验室开放基金(2014QN18)

摘　　要：以单质Si和不同的二氧化硅(Si O_2含量分别为99.999%的高纯石英玻璃、99.70%的分析纯二氧化硅、99.14%的工业石英、97.67%的微硅粉)为原料,于1460℃下高纯氮气中反应合成Si_2N_2O,用XRD、SEM和TEM等方法研究了合成产物的相组成和形貌特征。结果表明:不同的二氧化硅源高温氮化合成的试样中Si_2N_2O的含量均达到91%以上;合成的试样中Si_2N_2O的形貌均为柱状或片层状,合成试样中Si_2N_2O的各元素的原子比也接近Si_2N_2O的理论原子比。The micron Si2N2O was synthesized through nitride reaction of substance silicon and four kinds of silica as raw materials in vacuum induction furnace filled with highly pure nitrogen at 1460℃ for 3 hours. The phase composition and microstructure of the Si2N2O were analyzed by XRD, SEM, and TEM. Results show that the content of Si2N2O in the samples synthesized respectively from high purity quartz glass, analytically pure silica, quartz and silica fume as a silica source is more than 91%. The morphology of Si2N2O in the synthesized sample is columnar or lamellar. The atomic ratio in the product of Si2N2O is close to the atomic ratio of Si2N2O in theory.

关 键 词：氧氮化硅 二氧化硅源 高温氮化 

分 类 号：TQ174.75[化学工程—陶瓷工业]