双光束超分辨激光直写纳米加工技术  

Dual-beam super-resolution direct laser writing nanofabrication technology

作　　者：曹耀宇 谢飞 张鹏达 李向平 

机构地区：[1]暨南大学光子技术研究院广东省光纤传感与通信技术重点实验室,广州510632

出　　处：《光电工程》2017年第12期1133-1145,共13页Opto-Electronic Engineering

基　　金：国家自然科学基金项目(61605061);广东省自然科学基金(2016A030313088)

摘　　要：随着纳米技术的不断发展,各行业领域对纳米尺寸结构的加工需求与日剧增,激光直写加工技术作为一项重要的三维微纳结构加工手段,在多个现代科学技术领域得到了广泛应用。针对三维微纳结构制备,双光束超分辨激光加工技术,结合双光子聚合(TPP)过程与受激发射损耗(STED)纳米显微技术的原理,实现了超光学衍射极限的加工分辨率,为三维纳米结构加工技术及其应用提供了新的发展方向。本文将阐述基于双光束超分辨激光加工技术超光学衍射极限的基本原理,并回顾该技术在改善加工线宽及分辨率等方面的研究进展,以及在相关领域中的应用。最后就如何实现低成本、高效率、大面积、多功能性材料加工存在的挑战和未来发展方向进行了讨论。With the development of nanotechnology, emerging nanotechniques compel dramatically increasing demands on nanostructures’ fabrication. As an important three-dimensional micro/nanostructures’ fabrication method, direct laser writing has been widely applied in various modern scientific technological fields. To realize three dimensional micro/nanostructures, dual-beam super-resolution direct laser writing technique, combined with two-photon polymerization（TPP） method and stimulated emission depletion（STED） principle, has successfully realized resolution beyond optical diffraction limit, and uphold exceptional 3 D nanofabrication scheme. The principle of dual-beam super-resolution laser direct writing and recent progress in improving line width and resolution have been demonstrated in the review. We have also summarized emerging applications of dual-beam super-resolution laser direct writing in relevant fields. Eventually, challenges in how to fulfill low-cost, high efficiency, large area and multi-functional materials’ fabrication and its future development are discussed.

关 键 词：激光直写加工 光聚合 受激辐射损耗 超分辨光学技术 三维纳米结构 

分 类 号：TN249[电子电信—物理电子学]