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机构地区:[1]成都飞机工业(集团)有限责任公司制造工程部,辽宁沈阳110034 [2]南昌航空大学轻合金加工科学与技术国防重点学科实验室,江西南昌330063
出 处:《电镀与精饰》2018年第1期17-21,共5页Plating & Finishing
摘 要:本文研究了电镀微裂纹硬铬的工艺参数和添加剂对镀层裂纹长度、深度和密度的影响。借助3D显微镜以及SEM观察镀层表面微裂纹,并将自行研发的ND-331微裂纹镀铬工艺与标准镀铬工艺、国外知名品牌的HCR镀铬工艺进行了对比。结果表明,研发的ND-331微裂纹镀铬工艺电流效率可达20.5%,镀铬层裂纹密度为1020条/cm、硬度为989.9 HV,其性能优于标准镀铬,与HCR镀铬相当。In this paper, the process parameters of micro- crack hard chrome plating and the effects of ad- ditives on the length, depth and density of the coating cracks were studied. The self-developed ND- 331microcrack chrome plating process was compared to the standard chrome plating process and the well- known foreign brand HCR chrome plating process by observing the surface micro-cracks with 3D micro- scope and SEM. Results showed that the current efficiency of ND-331 process was up to 20.5%, the crack density of the chrome plated coating was 1020/cm, and the hardness was 989.9 HV, its perform- ance was better than that of the standard chrome plating and equal to the HCR chrome plating.
分 类 号:TQ153.11[化学工程—电化学工业]
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