低压高密度等离子体电极性能研究  

Study on Emission Performance of Low Voltage and High Density Plasma Electrode

作　　者：李道儒 李炳辰[1] 张生俊 张亚非[1] 

机构地区：[1]上海交通大学薄膜与微细加工教育部重点实验室,上海201100

出　　处：《科学技术与工程》2018年第2期1-6,共6页Science Technology and Engineering

基　　金：国家自然科学基金(61574091)资助

摘　　要：设计了一种玻璃管式封闭等离子体腔室,以高频开关电源为工作电源,高纯氩气(体积分数为99.999%)为工作气体,结合汤森放电理论,推导了等离子体密度与电流之间的关系,结合实验结果对该理论进行了验证,并测试了不同压强,不同电极下的封闭式等离子体密度。实验结果表明,在以纯金属热阴极材料钨为电极,工作电流为200 mA,管内气压为66 Pa(0.5 torr)的条件下,可将封闭式等离子体密度提高至1.1×10^(13)cm^(-3)。对封闭式等离子体密度与电流、腔室内气体压强及腔室电极之间的关系进行了分析,探索得到了一种封闭腔体内获得接近电弧放电高密度等离子体的方法。A glass tube closed plasma chamber is designed.The high-frequency switching power supply is used as the working power source and the high purity argon gas（99.999%）is used as the working gas.The relationship between plasma density and current is deduced based on the theory of Townsend discharge,and the theory is validated by the experimental results,and tested the different pressure,different electrodes under the closed plasma density.The experimental results show that the closed plasma density can be increased to 1.1×10^（13）cm^（-3） under the condition that the pure hot metal cathode material is used as the electrode,the working current is 200 mA and the tube pressure is 66 Pa（0.5 torr）.The relationship between the density of the closed plasma and the current,the gas pressure in the chamber and the chamber electrode is analyzed,and a method of obtaining the high density plasma close to the arc discharge in the closed cavity is explored.

关 键 词：等离子体密度 Langmuir双探针 低气压封闭式等离子体 电子发射 

分 类 号：O461.2[理学—电子物理学]