硒化锌衬底表面仿生宽带增透微结构的设计及制作  

Design and Fabrication of Bionic Broadband Antireflective Microstructure on Zinc Selenide

作　　者：费亮 崔云[2] 万冬云[1] 陈鹏[2,3] 徐姣 Fei Liang;Cui Yun;Wan Dongyun;Chen Peng;Xu Jiao(School of Materials Science and Engineering, Shanghai University, Shanghai 200444, China;Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China;University of Chinese Academy of Sciences, Beijing 100049, China)

机构地区：[1]上海大学材料科学与工程学院,上海200444 [2]中国科学院上海光学精密机械研究所中科院强激光材料重点实验室,上海201800 [3]中国科学院大学,北京100049

出　　处：《光学学报》2018年第1期46-52,共7页Acta Optica Sinica

基　　金：国家自然科学基金项目(61405225)

摘　　要：采用时域有限差分法研究了硒化锌基底的抛物线型周期阵列仿生微结构的光学性质,重点分析了微结构阵列的周期、高度、占空比和形状轮廓等对反射率的影响,得到了有较好增透效果的结构参数。根据模拟参数进行两次干涉曝光制备掩模,采用反应离子刻蚀技术制备周期阵列微结构。通过场发射扫描电子显微镜对微结构的表面形貌进行表征,并采用傅里叶变换红外光谱仪在中红外波段分别对双面抛光、单面微结构的硒化锌片进行透过率测试。结果表明:单面微结构样品在2~5μm范围内的整体平均透过率比双面抛光硒化锌基片提高了10%,在2.3μm处的最大透过率为82%。The optical properties of parabolic cone array microstructure of zinc selenide are researched by finitedifference time-domain method.The effects of microstructure parameters,such as period,height,filling factor,and profile shape on the reflectivity are discussed.Structural parameters corresponding to good antireflection effect are obtained.The parabolic cone period microstructure is prepared by twice interference lithography and reactive ion etching technology according to the simulated results.The surface morphology is analyzed by field emission scanning electron microscopy,and the transmittances of the zinc selenide with double-sides polished and single-side microstructures are respectively measured with the utilization of the Fourier transform infrared spectrometer.The measured results illustrate that the average transmittance of samples with single-sided microstructure is 10% higher than that of double-sided polished zinc selenide at 2-5μm wavelengths,and the transmittance reaches a maximum value of 82% at 2.3μm.

关 键 词：衍射 增透微结构 时域有限差分法 干涉曝光 

分 类 号：TN213[电子电信—物理电子学] O485[理学—固体物理]