Simulation of propagation of the HPM in the low-pressure argon plasma  

作　　者：李志刚 袁忠才 汪家春 时家明 

机构地区：[1]State Key Laboratory of Pulsed Power Laser Technology, Hefei 230037, People's Republic of China

出　　处：《Plasma Science and Technology》2018年第2期110-114,共5页等离子体科学和技术（英文版）

基　　金：supported by National High Technology Research and Development Program of China(Grant No.2015AA8016029A)

摘　　要：The propagation of the high-power microwave（HPM） with a frequency of 6 GHz in the lowpressure argon plasma was studied by the method of fluid approximation.The two-dimensional transmission model was built based on the wave equation,the electron drift-diffusion equations and the heavy species transport equations,which were solved by means of COMSOL Multiphysics software.The simulation results showed that the propagation characteristic of the HPM was closely related to the average electron density of the plasma.The attenuation of the transmitted wave increased nonlinearly with the electron density.Specifically,the growth of the attenuation slowed down as the electron density increased uniformly.In addition,the concrete transmission process of the HPM wave in the low-pressure argon plasma was given.The propagation of the high-power microwave（HPM） with a frequency of 6 GHz in the lowpressure argon plasma was studied by the method of fluid approximation.The two-dimensional transmission model was built based on the wave equation,the electron drift-diffusion equations and the heavy species transport equations,which were solved by means of COMSOL Multiphysics software.The simulation results showed that the propagation characteristic of the HPM was closely related to the average electron density of the plasma.The attenuation of the transmitted wave increased nonlinearly with the electron density.Specifically,the growth of the attenuation slowed down as the electron density increased uniformly.In addition,the concrete transmission process of the HPM wave in the low-pressure argon plasma was given.

关 键 词：low-pressure argon plasma high-power microwave protection application 

分 类 号：O53[理学—等离子体物理]