低温活化合成含硅氮氧化物材料研究进展  

Progress in Activated-synthesis of Si-based Oxynitrides Materials at Low Temperatures

作　　者：刘茜[1] 周真真[1,2] 

机构地区：[1]中国科学院上海硅酸盐研究所,高性能陶瓷和超微结构国家重点实验室,上海200050 [2]中国科学院大学,北京100049

出　　处：《无机材料学报》2018年第2期129-137,共9页Journal of Inorganic Materials

摘　　要：含硅氮氧化物是一类重要的结构/功能一体化材料,在耐磨耐蚀、高速切削、压力密封、发光基质和碱性催化等领域有重要应用。含硅氮氧化物制备技术经历了高温固相反应法、自蔓延高温合成法、碳热还原氮化法、湿化学合成结合碳热还原氮化法等演变,呈现持续发展的态势。本文综述了作者研究团队十余年在低温活化合成含硅氮氧化物粉体及纤维的研究进展,重点介绍基于介孔模板组装的微纳尺度碳热还原氮化法以及Si C还原辅助溶胶–凝胶氮化法制备含硅氮氧化物,并展望了低温活化合成含硅氮氧化物材料的发展方向和应用前景。Si-based oxynitride is an important type of structure/function integrated materials and has got wide ap- plications in the fields of wear resistance, corrosion resistance, high speed cutting, pressure sealing, phosphors host, alkaline catalysis, and so on. The preparation of Si-based oxynitrides powders has undergone different development stages： high temperature solid state reaction （SSR）, self-propagating high temperature synthesis （SHS）, carbother- mal reduction and nitridation （CRN）, wet-chemical route combined with CRN, and others, presenting a sustained development trend. In this paper, the research progress in the activated-synthesis of Si-based oxynitrides powders and fibers at low calcination temperatures is reviewed over the past ten years, mainly focusing on the carbothermal reduction nitridation at micro-nano scale based on mesoporous template assembly as well as SiC reduction assisted Sol-Gel nitridation method. The development trend and applications of the low temperature activated-synthesis of Si-based oxynitrides materials are also prospected.

关 键 词：含硅氮氧化物 介孔膜板组装 碳热还原氮化 SiC还原剂 溶胶-凝胶 综述 

分 类 号：O61[理学—无机化学]