高温高能特种离子注入机靶室控制系统设计  

Designing of a EndStation Control System for A High Temperature And High Energy Special Implanter

作　　者：蔡先武 钟新华 

机构地区：[1]湖南红太阳光电科技有限公司,湖南长沙410205

出　　处：《电子工业专用设备》2018年第1期14-20,共7页Equipment for Electronic Products Manufacturing

摘　　要：提出了一种基于NI CompactRIO嵌入式实时控制器的高温高能离子注入机靶室控制系统;介绍了高温高能离子注入机的靶室控制系统主要功能、工作原理和系统组成。靶室控制系统采用NI CompactRIO实时测量与控制器作为靶室控制系统的主控制器,实现注入扫描运动控制、靶台加热控制和离子注入剂量及均匀性控制算法等。离子注入机的束流、剂量的采集和束的水平方向扫描控制通过基于单片机系统的剂量控制器来实现。其硬件构成和软件结构也作了详细的介绍。最后,通过实验验证了靶室控制系统的性能达到设计要求。A NI CompactRIO-Based End Station control system for implant is presented in this paper.Firstly,the theory of the control system and hardware architecture is introduced. The main Controller of this system is a NI CompactRIO real time measure and control system. It＇s main functions that temperature control,motion control and some algorithm of dose and dose uniformity control. The most important unit that dose controller of this control system is described. The control system is implemented and evaluated by simulation as well as experimental equipment.

关 键 词：CompactRIO嵌入式实时控制器 剂量控制器 束流与剂量测量 均匀性控制 

分 类 号：TN305[电子电信—物理电子学]