Observation of Tunneling Gap in Epitaxial Ultrathin Films of Pyrite-Type Copper Disulfide  

作　　者：Chong Liu Haohao Yang Can-Li Song Wei Li Ke He Xu-Cun Ma Lili Wang Qi-Kun Xue 刘充;杨好好;宋灿立;李渭;何珂;马旭村;王立莉;薛其坤(State Key Laboratory of Low-Dimensional Quantum Physics,Department of Physics,Tsinghua University,Beijing 100084;Collaborative Innovation Center of Quantum Matter,Beijing 100084)

机构地区：[1]State Key Laboratory of Low-Dimensional Quantum Physics,Department of Physics,Tsinghua University,Beijing 100084 [2]Collaborative Innovation Center of Quantum Matter,Beijing 100084

出　　处：《Chinese Physics Letters》2018年第2期97-101,共5页中国物理快报(英文版)

基　　金：Supported by the National Natural Science Foundation of China under Grant Nos 11574174,11774193 and 11790311;the National Basic Research Program of China under Grant No 2015CB921000

摘　　要：We report scanning tunneling microscopy investigation on epitaxial ultrathin films of pyrite-type copper disulfide.Layer-by-layer growth of CuS_(2)films with a preferential orientation of(111)on SrTiO_(3)(001)and Bi_(2)Sr_(2)Ca Cu_(2)O_(8+)substrates is achieved by molecular beam epitaxy growth.For ultrathin films on both kinds of substrates,we observe symmetric tunneling gap around the Fermi level that persists up to^15 K.The tunneling gap degrades with either increasing temperature or increasing thickness,suggesting new matter states at the extreme twodimensional limit.

分 类 号：O484[理学—固体物理] TD951.1[理学—物理]