基于二维LDV低压流场速度测量的研究  

Study on Velocity Measurement of Low Pressure Flow Field Based on Two-Dimensional LDV

作　　者：邹胜 杨铁牛[1,2] 黄尊地 吴宗跃 赵蕾蕾 Zou Sheng1,2, Yang Tieniu1,2, Huang Zundi3 , Wu Zongyue1,2, Zhao Leilei1,2(1. School of Mechanical and Electrical Engineering, Wuyi University, Jiangmen 529020, China; 2. Jiangmen CAD~CAM Engineering and Technology Research and Development Center,Jiangmen 529020, China; 3. School of Rail Transportation, Jiangrnen 529020, China)

机构地区：[1]五邑大学机电工程学院,江门529020 [2]江门市CAD/CAM工程技术研发中心,江门529020 [3]五邑大学轨道交通学院,江门529020

出　　处：《真空科学与技术学报》2018年第3期169-175,共7页Chinese Journal of Vacuum Science and Technology

基　　金：国家科技重大专项资助项目(No.2011ZX02403-004)

摘　　要：在半导体制造领域中,IC装备工艺腔室流场的均匀性决定镀膜的质量。本文运用二维激光多普勒测速仪(LDV)对真空腔室进行内流场测量,研究了在不同进气量、不同腔室压强下,腔室各平面流速的分布规律。研究表明,粒子浓度和背景噪声是影响腔室流速测量的两大关键因素,采用四种方法有效地降低了背景噪声对信号的干扰;通过大量实验得出了LDV有效测量腔室流速的压力范围,以及腔室压强、进气量与流速之间的关系;验证了腔室内二级匀气装置具有均匀布气的功能。研究结果能为IC装备的设计提供数据支持。In the field of semiconductor manufacturing, the uniformity of the flow field in the IC equipment process chamber determines the quality of the coating. In this paper, a laser Doppler velocimeter （LDV） was used to measure the internal flow field of the vacuum chamber. Under different air intake and different chamber pres- sures, the distribution of the gas-velocity in each plane of the chamber was studied. The results show that the particle concentration and background noise are the two key factors that affect the measurement of gas-velocity in the cham- ber. Four methods are used to effectively reduce the interference of the background noise to the signal. Through a large number of experiments, the pressure range of the LDV to measure the gas-velocity of the chamber, as well as the relationship between the chamber pressure, the air intake and the gas-velocity is obtained. It verifies that the secondary homogenizer in the chamber has the function of uniform air distribution. The results provide data support for the design of IC equipment.

关 键 词：二维激光多普勒测速仪 真空腔室 粒子浓度 背景噪声 流速测量 

分 类 号：TB75[一般工业技术—真空技术]