钨涂层的几种沉积制备技术研究进展  

Research Progress of Several Preparation Techniques for Tungsten Coating

作　　者：王占雷 陈长安[1] 朱开贵[2] 杨飞龙[1] 周行 WANG Zhan-lei;CHEN Chang-an;ZHU Kai-gui;YANG Fei-long;ZHOU Hang(Key Laboratory of Surface Physics and Chemistry, Mianyang 621907, China;School of Physics and Nuclear Energy Engineering, Beihang University, Beijing 100191, China)

机构地区：[1]表面物理与化学重点实验室,四川绵阳621907 [2]北京航空航天大学物理科学与核能工程学院,北京100191

出　　处：《材料保护》2018年第3期93-97,120,共6页Materials Protection

基　　金：中国工程物理研究院聚变能源中心资助项目(R2014-0304);国家自然科学基金资助项目(51471154)

摘　　要：难熔金属钨具有高强度、低蒸汽压、无化学腐蚀性等优点,被选为核聚变堆面向等离子体材料。通过各种工艺手段将钨涂覆在基体材料表面,是制作面向等离子体部件的新技术。综述了国内外几种钨涂层的制备工艺,主要包括:气相沉积法、等离子喷涂法以及熔盐电镀,介绍了其各自的优缺点,指出离子液体电沉积技术在室温下就可以完成金属薄膜的制备,值得进一步探索其工程化应用。As a kind of refractory material, tungsten has advantages such as high strength, low vapor pressure and no chemical erosion, and therefore is considered as the potential plasma-facing material for the nuclear fusion reactor. Tungsten coatings on the surface of the matrix ma- terials were fulfilled through various processes, which are new technologies for the plasma-facing components. In this paper, several preparation technologies of tungsten coatings were summarized, including vapor deposition, plasma spray and molten salt plating. The advantages and dis- advantages of various techniques were introduced and it was pointed out that ionic liquid electrodeposition for the preparation of the metallic films at room temperature was worth further exploring for the engineering application.

关 键 词：面向等离子体 钨涂层 喷涂 电沉积 

分 类 号：TB333[一般工业技术—材料科学与工程]