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作 者:赵帅锋[1] 吕少波[1] 王瑞生[1] 姜超 胡雯雯[1] 李明华[1] 穆佳丽 ZHAO Shuai-feng, LV Shao-bo, WANG Rui-sheng, JIANG Chao, HU Wen-wen, LI Ming-hua, MU Jia-li(HB Optical, Shenyang Academy of Instrumentation Science Co. Ltd, Shenyang 110043, Chin)
机构地区:[1]沈阳仪表科学研究院有限公司,汇博光学,辽宁沈阳110043
出 处:《真空》2018年第2期10-13,共4页Vacuum
摘 要:以Nb_2O_5和SiO_2为光学镀膜材料设计了可见光区双通带BP561nm&BP687nm超多层膜系干涉滤光片。采用直接光控和速率控制混合的膜厚监控方案,制造工艺采用OMS Simulator设计并模拟镀膜过程,模拟膜厚误差优于±0.1%,并在PARMS镀膜机上进行镀制。制造光谱结果:双通带滤光片波长定位精度均小于±2nm,峰值透过率高于95%,截止区300-950nm背景优于OD6,完全满足荧光检测的成像需求。A VIS dual-band-pass filter BP561 nmBP687 nm was designed by using Nb_2O_5 and SiO_2 as high and low index materials. During the design of coating process, a hybrid layer thickness control scheme with both optical monitoring and RATE control was adopted. The coating process was simulated by using OMS Simulator, and the simulation result indicates that layer thickness can be controlled within an error of less than ±0.1%. The filter was manufactured on a PARMS coating machine and the measuring result shows that the center wavelength positioning accuracy of the two passbands is less than ±2 nm, the peak transmittance is higher than 95%, and the blocking density is better than OD6 in region from 300 to 950 nm.
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