步进投影光刻机及其常见故障分析  

Stepper Projection Lithography and Its Common Faults Analysis

作　　者：雷宇[1] LEI Yu(The 13th Research Institute of CETC, Shijiazhuang 050051, China)

机构地区：[1]中国电子科技集团公司第十三研究所,河北石家庄050051

出　　处：《电子工业专用设备》2018年第2期40-45,共6页Equipment for Electronic Products Manufacturing

摘　　要：根据步进投影光刻机的基本原理及其基本结构,分析了影响投影光刻工艺的主要因素。根据多年对设备的维修经验,总结了ASML步进投影光刻机的常见故障并给出了相应的解决方法。This paper introduces the basic principle of the stepper projection lithography and its basic structure,analyzing the main factors influenced the lithography process. According to the experience in maintenance,summarizes the stepper projection lithography common faults,and gives the corresponding solutions.

关 键 词：曝光 预对准 调平调焦 同轴对准 

分 类 号：TN305[电子电信—物理电子学]