机构地区:[1]School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwongju 61005, Republic of Korea [2]Department of Biotechnology, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 03722, Republic of Korea [3]Department of Chemistry, Sookmyung Women's University, Seoul 04310, Republic of Korea [4]Center for Cell-Encapsulation Research, Department of Chemistry, KAIST, Daejeon 34141, Republic of Korea [5]Department of Applied Chemistry, Kyung Hee University, Yongin, Gyeonggi 17104, Republic of Korea
出 处:《Nano Research》2018年第5期2532-2543,共12页纳米研究(英文版)
摘 要:In this study, we report that height-controlled vertically etched silicon nano- column arrays (vSNAs) induce strong growth cone-to-substrate coupling and accelerate in vitro neurite development while preserving the essential features of initial neurite formation. Large-scale preparation of vSNAs with flat head morphology enabled the generation of well-controlled topographical stimulation without cellular impalement. A systematic analysis on topography- induced variations on cellular morphology and cytoskeletal dynamics was conducted. In addition, neurite development on the grid-patterned vSNAs exhibited preferential adhesion to the nanostructured region and outgrowth directionality. The arrangement of cytoskeletal proteins and the expression of a focal adhesion complex indicated that a strong coupling existed between the underlying nanocolumns and growth cones. Furthermore, the height-controlled nanocolumn substrates differentially modulated neurite polarization and elongation. Our findings provide an important insight into neuron-nanotopography interactions and their role in cell adhesion and neurite development.In this study, we report that height-controlled vertically etched silicon nano- column arrays (vSNAs) induce strong growth cone-to-substrate coupling and accelerate in vitro neurite development while preserving the essential features of initial neurite formation. Large-scale preparation of vSNAs with flat head morphology enabled the generation of well-controlled topographical stimulation without cellular impalement. A systematic analysis on topography- induced variations on cellular morphology and cytoskeletal dynamics was conducted. In addition, neurite development on the grid-patterned vSNAs exhibited preferential adhesion to the nanostructured region and outgrowth directionality. The arrangement of cytoskeletal proteins and the expression of a focal adhesion complex indicated that a strong coupling existed between the underlying nanocolumns and growth cones. Furthermore, the height-controlled nanocolumn substrates differentially modulated neurite polarization and elongation. Our findings provide an important insight into neuron-nanotopography interactions and their role in cell adhesion and neurite development.
关 键 词:vertical silicon nanostructures metal-assisted chemical etching primary hippocampal neurons neurite outgrowth cytoskeletal dynamics
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