基于混响室的电场探头校准方法研究  

Research on E-field Probe Calibration in Reverberation Chamber

作　　者：王淞宇 齐万泉 WANG Song-yu;QI Wan-quan(Beijing Institute of Radio Metrology ＆ Measurement, Beijing 100039, China)

机构地区：[1]北京无线电计量测试研究所,北京100039

出　　处：《宇航计测技术》2018年第1期23-26,共4页Journal of Astronautic Metrology and Measurement

摘　　要：针对电场探头在高场强下的校准需求,本文提出了利用混响室开展电场探头校准,介绍了基于混响室的电场探头校准原理和校准方法,解决了200V/m以上高场强环境下电场探头的校准问题,并与微波场强标准中的测量结果进行了对比分析。两组测量结果具有较好的一致性。The calibration of an E-field probe at high field is concerned. The method of E-field probe calibration in reverberation chamber is proposed in the paper. It introduces the calibration principle of E-field probe calibration in reverberation chamber. It resolves the problem of E-field probe calibration above 200 V/m. Compare the measurement result with the result measured in the microwave field strength standard. The two groups of measurement result behave well in coincidence.

关 键 词：混响室 电场探头 校准 

分 类 号：TN98[电子电信—信息与通信工程]