低氧分压下NiTi记忆合金的氧化行为（英文）  

Oxidation Behavior of NiTi Alloy Under Low Oxygen Partial Pressure

作　　者：邵明增 赵旭[1,2] 杨洪波 Shao Mingzeng;Zhao Xu;Yang Hongbo(Xi＇an University of Architecture and Technology, Xi＇an 710055, China;Key Laboratory of Gold and Resources of Shaanxi Province, Xi＇an 710055, China;Research Centre of Metallurgical Engineering ＆ Technology of Shaanxi Province, Xi＇an 710055, China)

机构地区：[1]西安建筑科技大学,陕西西安710055 [2]陕西省黄金与资源重点实验室,陕西西安710055 [3]陕西省冶金工程技术研究中心,陕西西安710055

出　　处：《稀有金属材料与工程》2018年第4期1107-1112,共6页Rare Metal Materials and Engineering

基　　金：The Natural Science Basic Research Program of Shaanxi Province(2013JQ6017);Foundation of Xi’an University of Architecture and Technology(RC1329)

摘　　要：研究了NiTi形状记忆合金在H_2-H_2O气氛下400~700℃的氧化行为。合金的氧化过程遵循立方规律,氧化激活能127.52 kJ/mol。氧化显著降低了试样表面的Ni含量。400℃氧化的试样,其表面形貌与其他试样不同,并且氧化膜太薄,截面结构无法用SEM分析。500、600、700℃氧化的试样,表面有2种形貌的氧化物,一种是颗粒状氧化物,另一种是晶须状氧化物。截面分析表明,氧化膜分为两层,上层由TiO_2构成,下层由Ni_3Ti构成,两层界面处有孔洞生成。The isothermal oxidation behavior of NiTi alloy in H2-H2O in the temperature range from 400 ℃ to 700 ℃ was studied. The results show that the oxidation rate of the NiTi alloy follows cubic laws, and the activation energy for the oxidation of the alloy is determined to be 127.52 kJ/mol. The surface Ni content is significantly reduced by selective oxidation. For the sample oxidized at 400 ℃, the morphology is different from those formed at high temperatures. For the samples oxidized at 500, 600,and 700 ℃, the oxide scales show two morphologies, which consist of cubic grains and oxide whiskers. Cross-section analyses show that the oxide scales consist of an outer TiO2 layer and an inner Ni3Ti layer. Voids form near the interface of the two layers.

关 键 词：NITI合金 选择氧化 低氧分压 TIO2 

分 类 号：TG139.6[一般工业技术—材料科学与工程]