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作 者:陈浩[1] 万强 刘念 蔡耀[1] 刘琰[1] 吴忠烨 陈燕鸣[1] 杨兵[1] CHEN Hao1, WAN Qiang2, LIU Nian2, CAI Yao1, LIU Yan1, WU Zhong-ye1, CHEN Yan-ming1, YANG Bing1(1. School of Power & Mechanical Engineering, Wuhan University, Wuhan 430072, China; 2. College of Engineering, Huazhong Agricultural University, Wuhan 430070, Chin)
机构地区:[1]武汉大学动力与机械学院,湖北武汉430072 [2]华中农业大学工学院,湖北武汉430070
出 处:《材料保护》2018年第4期29-34,38,共7页Materials Protection
基 金:国家自然科学基金(11275141);中央高校基本业务经费(2662016QD045;2662015QD013)资助
摘 要:为了研究氮气气压对Ti Si N涂层显微结构与腐蚀行为的影响,采用自制多弧离子镀设备,在抛光的单晶(100)硅片与不锈钢基底上沉积Ti Si N涂层,沉积气压0.5~2.5 Pa,利用X射线衍射仪(XRD)、X射线光电子能谱(XPS)、高分辨透射电子显微镜(HRTEM)与电化学阻抗谱(EIS)表征涂层显微结构与电化学性能。结果表明:沉积的Ti Si N涂层为纳米晶-非晶复合结构,其中纳米Ti N晶体被非晶的Si3N4包围。当氮气气压从0.5 Pa升高到2.5 Pa之后,Ti Si N涂层晶粒尺寸由19.5 nm减小到8.0 nm。电化学阻抗随着氮气气压升高先增大后逐渐下降,沉积气压为1.0 Pa时,涂层抗腐蚀性能最强。TiSiN coatings were deposited on polished Si (100) wafer and stainless steel substrate under various nitrogen pressures from 0.5 Pa to 2.5 Pa by using a home-made cathodic arc ion plating system, for investigating the effects of nitrogen pressure on the microstructure and cor- rosion behavior of TiSiN coating. X-ray diffractometer (XRD), X-ray photoelectron spectroscopy (XPS), high resolution transmission electron microscopy (HRTEM) and electron impedance spectroscopy (EIS) were employed to characterize the microstructures and electrochemical properties of coatings. Results showed that the obtained TiSN coating was of nanocrystal/amorphous composite structure, and the TiN nano - crystals were embedded in Si3N4. As the nitrogen pressure increased from 0.5 Pa to 2.5 Pa, the grain size decreased from 19.5 nm to 8.0 nm. Besides, the corrosion resistance of TiSiN coatings increased initially and then decreased gradually with the increase of N2 pressure. When the deposition pressure was 1.0 Pa, the prepared coating possessed the optimal corrosion resistance.
关 键 词:TiSiN涂层 多弧离子镀 氮气气压 显微结构 抗腐蚀
分 类 号:TG174.444[金属学及工艺—金属表面处理]
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