锆合金表面射频磁控溅射SiC涂层制备工艺参数优选  

Process Parameter Optimization of SiC Coatings on Zirconium Alloy Surface by Radio Frequency Magnetron Sputtering

作　　者：王晓婧[1] 刘艳红[1] 刘威 李怀林[1] WANG Xiao-jing1, LIU Yan-hong1, LIU Wei2, LI Huai-lin1(1. State Power Investment Corporation Central Research Institute, Beijing 102209, China; 2. School of Materials Science and Engineering, University of Science and Technology, Beijing 100083,Chin)

机构地区：[1]国家电投集团中央研究院核燃料与材料研究所,北京102209 [2]北京科技大学材料科学与工程学院,北京100083

出　　处：《材料保护》2018年第4期74-79,共6页Materials Protection

基　　金：国家科技重大专项子课题项目(2015ZX06004001-002)资助

摘　　要：目前,国内针对锆合金包壳涂层技术研究相对较少。通过射频磁控溅射方法在锆合金基体表面沉积Si C涂层,研究了溅射功率、基片加热温度和溅射时间对涂层形貌、结合力和厚度的影响,确定了最佳的工艺参数为溅射功率200 W,加热温度400℃,溅射时间6 h。采用扫描电镜(SEM)及能谱仪(EDS)、扫描成像X射线光电子能谱仪(XPS)和X射线衍射仪(XRD)对该工艺参数下制备的Si C涂层样品进行了成分分析。结果表明,所制备的涂层的主要成分为非晶Si C。对优化Si C涂层样品进行了初步的高温水蒸气氧化试验,证明其具备一定的抗氧化性,但还有待提高。The radio frequency magnetron sputtering method was employed to make SiC coatings on zirconium alloy surface. The influences of sputtering power, temperature of base metal and sputtering time on microstructure, adhesion and thickness of coatings were researched. The obtained optimized parameter was that the substrate temperature was as follows： temperature of 400℃, sputtering power of 200 W and sputtering time of 6 h. The structure of the prepared coating under optimized parameters was characterized by SEM, EDS, XPS and XRD. Results showed that the coating was composed of amorphous SiC. The oxidation experiment in high-temperature steam proved that the SiC coating increased the oxidation resistance of the zirconium alloys in a certain degree, which needed to be further improved.

关 键 词：射频磁控溅射 SIC涂层 锆合金 结合力 高温水蒸气氧化 

分 类 号：TG174.444[金属学及工艺—金属表面处理]