多波长表面形貌测量系统中波长校准方法  被引量:3

The wavelength calibration method for multi-wavelength surface topography measurement system

在线阅读下载全文

作  者:杨练根[1] 杨光明 王选择[2] YANG Liangen;YANG Guangming;WANG Xuanze(Mechanical Engineering School of Hubei University of Technology, Wuhan 430068, China;Key Laboratory of Modern Manufacturing and Quality Engineering, Wuhan 430068, China)

机构地区:[1]湖北工业大学机械工程学院,湖北武汉430068 [2]湖北省现代制造质量工程重点实验室,湖北武汉430068

出  处:《光学技术》2018年第3期300-304,共5页Optical Technique

基  金:国家自然科学基金资助项目(51275157);精密测试技术及仪器国家重点实验室开放课题项目(PIL1602)

摘  要:表面形貌测量在光学元件加工制造和表面功能特性评定等方面有着非比寻常的意义。设计一种三波长轮换的表面形貌测量系统,与传统的白光相移干涉扫描等方法相比较,能够有效扩大测量深度以及形貌精度。多波长测量中波长带来的误差会极大的影响测量的精度,需要准确的校准波长。围绕三波长轮换表面形貌干涉测量系统,提出了利用平面镜干涉图校准三个滤光片波长的方法。通过对粗糙度样本的测量实验及计算结果显示:用校准后的波长计算标准方波样板得到的表面粗糙度数据与未使用为校准波长测得的结果相比其精度提高了1.3%,与标准数据相比较其相对误差仅为4.1%。Surface topography measurement is of great significance in the fabrication of optical components and the evaluation of surface functional properties. A three-wavelength surface topography measurement system is designed which is compared with the traditional white light phase shift interference,the multi-wavelength surface topography measurement system can effectively extend the measurement depth and the measurement accuracy of topography. Because the wavelength error in multi-wavelength interferometry greatly affects measurement accuracy,the wavelengths of light source is accurately calibrated. Based on the three-wavelength rotating surface topography interferometry system,A method for calibrating the wavelengths of three filters by using a planar mirror interferogram is presented. Through the measurement of roughness samples,the experimental results show:the surface roughness data obtained from the standard square wave pattern calculated with the calibrated wavelength was compared with the results measured using the original wavelength,the accuracy is improved by 1.3%,and the result was compared with the calibration data of China Academy of Metrology,the relative error is only 4.1%.

关 键 词:光学测量 表面形貌 多波长 相位差 波长校准 

分 类 号:TH742[机械工程—光学工程]

 

参考文献:

正在载入数据...

 

二级参考文献:

正在载入数据...

 

耦合文献:

正在载入数据...

 

引证文献:

正在载入数据...

 

二级引证文献:

正在载入数据...

 

同被引文献:

正在载入数据...

 

相关期刊文献:

正在载入数据...

相关的主题
相关的作者对象
相关的机构对象