制造单元布局问题的双目标模型与算法研究  

Research on Bi-Objective Model and Its Algorithm in Cellular Manufacturing Facility Layout Problem

作　　者：俞武扬[1] 方俊俊[1] YU Wu-yang;FANG Jun-jun(Management School, Hangzhou Dianzi University, Hangzhou 310018, China)

机构地区：[1]杭州电子科技大学管理学院,浙江杭州310018

出　　处：《运筹与管理》2018年第6期100-106,共7页Operations Research and Management Science

基　　金：国家社科基金资助项目(17BGL182);浙江省哲学社会科学规划项目(17NDJC053YB)

摘　　要：单元制造系统的布局对于提高系统的效率起着十分重要的作用。以最小化物料周转量和设施面积为目标,建立了一个单元制造系统布局的双目标优化模型,在该模型中不同制造单元的布局、单元内部不同设施的位置与方向这几个问题可以同时进行优化。基于模拟退火邻域解的变尺度生成机制和双目标抽样准则设计了模型的求解算法。算例表明本文算法所得Pareto解集优于经典的NSGA-Ⅱ算法。Layout has a significant role in the efficiency of cellular manufacturing systems. In this paper, a biobjective optimization model for facility layout of production cells in a cellular manufacturing system is proposed that minimizes both material turnover and floor space of facilities. The intra-cell facility layout, inter-cell facility sort and segment position in production cell, and orientation of facility can be optimized simultaneously. By designing variable metric implement mechanism of neighborhood solution and bi-objective sampling criteria, a bi- objective simulated annealing algorithm（BOSA） is developed to solve the model. The example of cellular layout problem demonstrates that, compared with the classical NSGA-Ⅱ, the BOSA can give better Pareto solution set.

关 键 词：单元制造系统 设施布局 模拟退火算法 双目标优化 

分 类 号：TH165[机械工程—机械制造及自动化]