基于AFAM纳米多孔氧化硅薄膜超声幅值成像的试验研究  

Experimental Research on Ultrasonic Amplitude Imaging of Nano-porous Silicon Oxide Film Based on AFAM

作　　者：张改梅[1] 曹玥 宋晓利[1] 何存富[2] 洪富 ZHANG Gaimei1, CAO Yue1, SONG Xiaoli1, HE Cunfu2, HONG Fu1(1. School of Packaging and Printing Engineering, Beijing Institute of Graphic Communication, Beijing 102600, China;2. College of Mechanical Engineering ＆ Applied Electronics Technology, Beijing University of Technology, Beijing 100124, Chin)

机构地区：[1]北京印刷学院印刷与包装工程学院,北京102600 [2]北京工业大学机械工程与应用电子技术学院,北京100124

出　　处：《北京工业大学学报》2018年第5期757-763,共7页Journal of Beijing University of Technology

基　　金：国家自然科学基金资助项目(51305038)

摘　　要：为研究原子力声学显微镜(atomic force acoustic microscopy,AFAM)技术检测纳米多孔氧化硅薄膜的超声幅值成像的影响因素,通过基于AFAM技术的谐振频率检测及超声幅值成像系统,试验得到了纳米氧化硅薄膜和纳米多孔氧化硅薄膜的前2阶接触谐振频率及其超声幅值成像,分析试验过程中的参数如激励频率、扫描频率对稳定性的影响及超声激励对纳米摩擦力的影响.试验结果显示,超声频率会影响超声幅值成像的对比度,超声激励降低了扫描过程中的摩擦力.To study the factors affecting ultrasonic amplitude imaging of porous silicon oxide nano-films based on atomic force acoustic microscopy（ AFAM） technology. The AFAM system was built,the silicon oxide and porous silicon oxide nano-films were detected,and the first two order contact resonance frequency and ultrasonic amplitude images were obtained. The influence of the parameters including excitation frequency and scanning frequency in the process of test on the stability and the influence of ultrasonic excitation on nano-friction were analyzed. Results show that the ultrasonic amplitude images are affected by excitation frequency and the ultrasonic excitation can reduce the friction in the scanning process.

关 键 词：原子力声学显微镜 纳米薄膜 幅值成像 超声激励 

分 类 号：U461[机械工程—车辆工程] TP308[交通运输工程—载运工具运用工程]