去Co深度及薄膜厚度对金刚石薄膜-硬质合金附着力的影响  

Effects of Cobalt Removal Depth and Film Thickness on Adhesion between Diamond Film and Cemented Carbide Substrate

作　　者：邓全[1,2] 满卫东 杨自立[1] 刘伟 易剑[2] 江南[2] Deng Quan;Man Weidong;Yang Zili;Liu Wei;Yi Jian;Jiang Nan(Hubei Key Laboratory of Plasma Chemistry and Advanced Materials（Wuhan Institute of Technology）,Wuhan Hubei 430073,China;Ningbo Institute of Materials Technology and Engineering,Chinese Academy of Sciences,Key Laboratory of Marine Materials and Protective Technologies of Zhejiang Province,Key Laboratory of Marine.Materials and Related Technologies,Ningbo Zhejiang 315201,China)

机构地区：[1]等离子体化学与新材料湖北省重点实验室(武汉工程大学),湖北武汉430073 [2]中国科学院宁波材料技术与工程研究所,海洋新材料与应用技术重点实验室,浙江省海洋材料与防护技术重点实验室,浙江宁波315201

出　　处：《硬质合金》2018年第2期86-94,共9页Cemented Carbides

摘　　要：金刚石薄膜与基体的附着力是影响CVD金刚石薄膜涂层刀具使用寿命的关键因素,沉积金刚石薄膜的膜-基附着力主要受硬质合金基体表面Co含量的影响。本文通过控制酸碱两步法中的酸处理时间及薄膜沉积时间,利用扫描电子显微镜、能谱仪、拉曼光谱仪、划痕测试仪等对样品进行分析检测,研究基体去Co深度及薄膜沉积厚度对金刚石薄膜的膜-基附着力的影响。结果表明:随着去Co深度的增加,膜-基附着力先增后降,但薄膜表面和截面形貌无明显变化,表明薄膜形貌主要受沉积参数影响;随着薄膜厚度增加,薄膜晶粒变大,膜-基附着力先增高后降低。去Co深度为7.1μm,薄膜厚度为19.5μm时所得薄膜的膜-基附着力最高,达到88.82 N。The adhesion between the diamond films and the substrate is a key factor in the service life of the CVD diamond film coating tools, the cobalt content on the surface of the cemented carbide substrate is the key factor affected the adhesion between the film and the substrate. In this research, the effects of the cobalt removal depth of the substrate and the thickness of the film on the adhesion between the diamond film and the substrate were investigated by controlling the acid treatment time in the two-step method and the film deposition time, and the samples were analyzed by using scanning electron microscope, energy spectrum analyzer, Raman spectrometer and scratch tester. The results show that with the increase of the depth of cobalt removal, the adhesion between the film and the substrate firstly increases and then decreases,but the surface and the cross-sectional morphology of the film do not significantly change, which indicates that the film morphology is mainly affected by the deposition parameters; As the thickness of the film increases, the grain size of the film becomes larger and the quality of the film becomes better, and the adhesion between the film and the substrate firstly increases and then decreases as well. When the depth of cobalt removal is 7.1 μm and the film thickness is 19.5 μm, the adhesion between the film and the substrate is the best, which reaches 88.82 N.

关 键 词：金刚石薄膜 硬质合金 去Co深度 薄膜厚度 附着力 

分 类 号：TG174.4[金属学及工艺—金属表面处理] TG711[金属学及工艺—金属学]