SrTiO_3衬底上BiFeO_3薄膜的制备方法与性能研究  

Preparation and Characterization of BiFeO_3 thin film

作　　者：贾曦[1] 梅艳 王君伟[2] Jia Xi;Mei Yan;Wang Jun wei(Leshan Vocational and Technical College,Sichuan Leshan 614000,China;Center for Optoetectronics Materials and Devices,Zhejiang Sci-Tech University,Hangzhou 310018,china)

机构地区：[1]乐山职业技术学院新能源工程系,四川乐山614000 [2]浙江理工大学光电材料与器件中心,浙江杭州310018

出　　处：《化工管理》2018年第24期192-193,共2页Chemical Engineering Management

摘　　要：在SrTiO_3衬底上,用脉冲激光溅射制备BiFeO_3单层膜,用XRD、AFM、SEM和EDS表征薄膜的晶体结构、表面形貌和组成。用X射线全反射法测量BiFeO_3膜厚为120nm,计算其沉积速率为0.67nm/min。BiFeO_3 thin film on SrTiO_3 substrate was prepared by pulsed laser deposition. The structure, morphology and size and composition were studied by X-ray diffraction（XRD）, atomic force microscopy（AFM）, scanning electron microscope（SEM）,Energy Dispersive spectrometer（EDS）, respectively. The thickness of thin film is 120 nm measured by total X ray reflection Technique（XRR）, and the deposition rate of film is 0.67 nm/min.

关 键 词：脉冲激光溅射 BIFEO3 薄膜 

分 类 号：TB383.2[一般工业技术—材料科学与工程]