外束PIXE束流均匀性测量与改善  

Beam uniformity measurement and improvement of external beam PIXE apparatus

作　　者：胥密 党永乐 王广甫[1,3] 褚莹洁 仇猛淋 郑力[1] 殷鹏[1] XU Mi;DANG Yongle;WANG Guangfu;CHU Yingjie;QIU Menglin;ZHENG Li;YIN Peng(College of Nuclear Science and Technology,Beijing Normal University,100875,Beijing,China;China Nuclear Power Engineering Co.,Ltd,100840,Beijing,China;Beijing Radiation Center,100875,Beijing,China)

机构地区：[1]北京师范大学核科学与技术学院,北京100875 [2]中国核电工程有限公司,北京100840 [3]北京市辐射中心,北京100875

出　　处：《北京师范大学学报（自然科学版）》2018年第4期472-475,共4页Journal of Beijing Normal University(Natural Science)

基　　金：北京市自然科学基金资助项目(1142006);中央高校基本科研业务费专项资金资助

摘　　要：外束PIXE束流均匀性是对非均匀性样品进行PIXE定量分析的基础.利用IP板对北京师范大学GIC4117 2×1.7 MV串列加速器外束PIXE束流均匀性进行了测量.通过在准直光栏前改用5μm的铝箔散焦膜,并用刀口厚度仅为0.1mm的铝准直光栏代替原有的碳准直光栏,改善前外束PIXE束流中心直径3.6mm内的离散程度为-65%~50%,改善后为-4.9%~2.8%.改善后的PIXE可直接用于Tisch安德森8级气溶胶采样器样品的元素定量分析,以及PIXE公司的分级式撞击采样仪第1~7级样品的元素定量分析.Beam uniformity is essential for quantitative analysis of heterogeneous samples by external beam particle-induced X-ray emission（PIXE）.Imaging Plate（IP）was employed to beam uniformity measurement in external beam PIXE.A 5μm-thick aluminum scattering foil was used to defocuse in front of collimators.Graphite collimators were replaced with 0.1 mm-thick aluminum collimators.Dispersion degree of beam was improved from-65%-50%to-4.9%-2.8% with a diameter of 3.6 mm.The upgraded external beam PIXE setup can be directly used for quantitative analysis of samples collected by Tisch Anderson cascade impactors,and it can be directly used for quantitative analysis from 2 to 8 stage for samples collected by PIXE International cascade impactors.

关 键 词：外束PIXE 束流均匀性 光栏 IP板 

分 类 号：TL52[核科学技术—核技术及应用]