基于专利计量的集成电路制造领域国际技术合作特征研究  

Research on the International Technological Collaboration Characteristics of IC Manufacturing through the Perspective of Patent Bibliometrics

作　　者：刘云 闫哲[2] 程旖婕[2] 叶选挺 LIU Yun;YAN Zhe;CHENG Yijie;YE Xuanting(School of Public Policy and Management,University of Chinese Academy of Sciences,Beijing 100049,China;School of Management and Economics,Beijing Institute of Technology,Beijing 100081,China)

机构地区：[1]中国科学院大学公共政策与管理学院,北京100049 [2]北京理工大学管理与经济学院,北京100081

出　　处：《科学学与科学技术管理》2018年第8期13-25,共13页Science of Science and Management of S.& T.

基　　金：国家重点研发计划专项课题(2017YFB1401100);国家自然科学基金项目(71810107004;71573017;71273030)

摘　　要：在建立集成电路制造领域国际合作专利数据库的基础上,采用专利关联度分析、社会网络分析等方法对世界各国进行国际技术合作的发展潜力、发展现状和合作效果进行分析,以把握该领域国际合作特征,揭示我国的优势和差距。结果发现:(1)美国在该领域拥有最强的技术创新及国际合作技术创新能力,德国与中国台湾则拥有较大的发展潜力;(2)亚、欧两洲因集群创新成为国际技术合作较成功区域,但集群内合作研究领域的趋同性阻碍了其进一步发展。最后,提出进一步提升我国国际合作水平的政策建议。In this paper, the development potential, development status and cooperation effect of each country/re- gion in international technological collaboration are analyzed on the basis of establishing the database of interna- tional cooperation patent of IC manufacturing industry. Through the above analysis, we want to grasp the intema- tional cooperation characteristics of IC manufacturing industry, and reveal the advantages and disadvantages of China. Findings include the following： First, with regard to technological innovation and international collabora- tion innovation, the United States is most successful, while Germany and Chinese Taipei have great potential for future development; Second, Asia and Europe have become successful areas of international technical coopera- tion because of cluster innovation, but the convergence of cooperative research orientation hinder further improve- ment of the nodes inside the cluster. Finally, this paper puts forward some suggestions on how to further en- hance the level of international cooperation in China.

关 键 词：集成电路制造 专利计量 国际技术合作 社会网络分析 

分 类 号：G306[文化科学] F061.5[经济管理—政治经济学]