Near-infrared carbon-implanted Er^3+/yb^3+ co-doped phosphate glass waveguides  被引量:1

Near-infrared carbon-implanted Er^3+/yb^3+ co-doped phosphate glass waveguides

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作  者:Xiaoliang SHEN Yue WANG Haitao GUO Chunxiao LIU 

机构地区:[1]College of Electronic and Optical Engineering, College of Microelectronics, Nanjing University of Posts and Telecommunications, Nanjing 210023, China [2]State Key Laboratory of Transient Optics and Photonics, Xi'an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences (CAS), Xi'an 710119, China

出  处:《Frontiers of Optoelectronics》2018年第3期291-295,共5页光电子前沿(英文版)

摘  要:The Er3+/yb3+ co-doped phosphate (EYDP) glass waveguides operated at 1539 nm have been manufactured by using the implantation technique of carbon ions under the condition of 6.0 MeV energy and 5.0 × 10^13 ions/cm2 fluence in this work. The ion implantation process was computed by means of the stopping and range of ions in matter. The dark-mode spectrum at 1539 nm of the waveguide was recorded by the method of the prism coupling measurement. The microscopic image of the fabricated structure was photographed by an optical microscope. It is the first step for the application of the waveguides on the base of EYDP glasses in optical- integrated photonic devices at near-infrared band.The Er3+/yb3+ co-doped phosphate (EYDP) glass waveguides operated at 1539 nm have been manufactured by using the implantation technique of carbon ions under the condition of 6.0 MeV energy and 5.0 × 10^13 ions/cm2 fluence in this work. The ion implantation process was computed by means of the stopping and range of ions in matter. The dark-mode spectrum at 1539 nm of the waveguide was recorded by the method of the prism coupling measurement. The microscopic image of the fabricated structure was photographed by an optical microscope. It is the first step for the application of the waveguides on the base of EYDP glasses in optical- integrated photonic devices at near-infrared band.

关 键 词:waveguide Er^3+/yb^3+ co-doped phosphate(EYDP) glasses carbon-ion implantation 

分 类 号:Q691.5[生物学—生物物理学] TN814[电子电信—信息与通信工程]

 

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