Continuous electropolishing technique for long-length Hastelloy C-276 tape  

作　　者：Shan-Peng Hao Yi Wang Hong-Li Suo Qiang Jia Min Liu Lin Ma 

机构地区：[1]School of Materials Science and Engineering,Beijing University of Technology

出　　处：《Rare Metals》2018年第9期795-802,共8页稀有金属（英文版）

基　　金：financially supported by the National Science Foundation of China (Nos.51571002,51401003);the Beijing Municipal Natural Science Foundation (Nos.2172008,KZ201310005003)

摘　　要：Preparation of the second-generation high-tem- perature superconducting tape by ion beam-assisted depo- sition （IBAD） requires a flat metal substrate. In this work, the electrochemical polishing of long-length Hastelloy C-276 alloy was studied, and its process parameters, characterized roughness and other properties were inves- tigated. A 10-meter-long Hastelloy C-276 alloy was pre- pared by electrochemical polishing. The following optimized processing parameters are obtained： temperature of 45 ℃, current density of 0.439 A.cm-2 and polishing time of 60 s. The average roughness value （Ra） of the surface is less than 5 nm （5 μm × 5 μm）, which was characterized by atomic force microscopy. This value sat- isfies the requirements for the further preparation of tran- sition-layer pair by the IBAD technology route.Preparation of the second-generation high-tem- perature superconducting tape by ion beam-assisted depo- sition （IBAD） requires a flat metal substrate. In this work, the electrochemical polishing of long-length Hastelloy C-276 alloy was studied, and its process parameters, characterized roughness and other properties were inves- tigated. A 10-meter-long Hastelloy C-276 alloy was pre- pared by electrochemical polishing. The following optimized processing parameters are obtained： temperature of 45 ℃, current density of 0.439 A.cm-2 and polishing time of 60 s. The average roughness value （Ra） of the surface is less than 5 nm （5 μm × 5 μm）, which was characterized by atomic force microscopy. This value sat- isfies the requirements for the further preparation of tran- sition-layer pair by the IBAD technology route.

关 键 词：Hastelloy C-276 alloy Electrochemicalpolishing Atomic force microscopy Current density 

分 类 号：TM26[一般工业技术—材料科学与工程] TG175[电气工程—电工理论与新技术]