机构地区:[1]Department of Electrical & Electronics Engineering,Standard Research Institute (SRI) [2]Department of Chemical Engineering,University of Bonab [3]Medical Laser Research Group,Medical Laser Research Center
出 处:《Journal of Advanced Ceramics》2018年第3期185-196,共12页先进陶瓷(英文)
摘 要:Pollution of water resources with pesticide compounds has raised serious environmental problems,and for photocatalytic degradation of these pollutants,thin film photocatalysts are preferred to colloidal ones due to the separation problem of colloidal nanoparticles.In this work,nanostructured TiO_2 and N-doped TiO_2 thin films with high transparency were deposited on glass and quartz substrates through sonochemical–chemical vapor deposition(CVD)method.The films prepared on glass and quartz substrates had nanocubic and nanospherical morphology,respectively.The presence of N atoms in the structure of TiO_2 resulted in a decrease in the band gap energy of TiO_2 and also in the reduction of photogenerated electron–hole recombination rate.Furthermore,the presence of N atoms induced the formation of Ti^(3+)species which can act as hole trapping centers.The prepared thin films were also used for the visible light photocatalytic degradation of paraoxon pesticide.According to these results among the prepared thin films,the N-doped TiO_2 thin films have higher photocatalytic activity than pure TiO_2 thin films.Moreover,in comparison with the thin films deposited on quartz substrate,the films on glass substrate have higher photocatalytic performance,which can be related to the special nanocubic morphology of these samples.Pollution of water resources with pesticide compounds has raised serious environmental problems,and for photocatalytic degradation of these pollutants,thin film photocatalysts are preferred to colloidal ones due to the separation problem of colloidal nanoparticles.In this work,nanostructured TiO_2 and N-doped TiO_2 thin films with high transparency were deposited on glass and quartz substrates through sonochemical–chemical vapor deposition(CVD)method.The films prepared on glass and quartz substrates had nanocubic and nanospherical morphology,respectively.The presence of N atoms in the structure of TiO_2 resulted in a decrease in the band gap energy of TiO_2 and also in the reduction of photogenerated electron–hole recombination rate.Furthermore,the presence of N atoms induced the formation of Ti^(3+)species which can act as hole trapping centers.The prepared thin films were also used for the visible light photocatalytic degradation of paraoxon pesticide.According to these results among the prepared thin films,the N-doped TiO_2 thin films have higher photocatalytic activity than pure TiO_2 thin films.Moreover,in comparison with the thin films deposited on quartz substrate,the films on glass substrate have higher photocatalytic performance,which can be related to the special nanocubic morphology of these samples.
关 键 词:N-DOPED TiO2 film TRANSPARENT PHOTOCATALYST chemical vapor deposition (CVD) ultrasonic
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