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作 者:李长鸣 张钧[1] 阎鑫 王建民[2] 李阳[2] 高术振[2] Li Changming;Zhang Jun;Yan Xin;Wang Jianmin;Li Yang;Gao Shuzhen(College of Mechanical Engineering,Shenyang University,Shenyang 110044,China;College of Mechanical and Eletrical Engineering,Hebei University of Engineering,Handan 056038,China)
机构地区:[1]沈阳大学机械工程学院,沈阳110044 [2]河北工程大学机电工程学院,邯郸056038
出 处:《真空科学与技术学报》2018年第10期887-893,共7页Chinese Journal of Vacuum Science and Technology
基 金:辽宁省自然科学基金项目(No.2015020216);河北省科技计划项目(No.16211003D)
摘 要:采用多弧离子镀技术制备了不同金属组元配比的(ZrTiAl) N硬质反应膜,进而考查金属组元配比对(ZrTiAl) N硬质反应膜的相组成和硬度的影响规律。为保证(ZrTiAl) N膜层中Zr、Ti、Al组元含量配比的规律性变化,对膜层沉积过程中弧源靶及电流分别进行了设定。通过扫描电镜进行(ZrTiAl) N膜层表面形貌和断面形貌观察及成分测定。X射线小角度衍射方法用于膜层相结构测试分析。采用VICKERS 402 MVD硬度仪测定膜层的表面硬度。所制备的(ZrTiAl) N膜层保持了膜层表面形貌、断面形貌以及膜层厚度的一致性。(ZrTiAl) N膜层均为单一固溶体型(ZrTiAl) N面心立方相组成,具有单一的(111)面择优生长取向,其点阵常数随金属组元配比的变化基本符合Vegard定律。在金属组元配比的较大变化范围内,(ZrTi Al) N膜层的相组成和择优生长取向未改变,均具有较高的硬度。在以Zr N为基的(ZrTiAl) N膜层中,Ti N和Al N的含量较大并且接近相等时,膜层容易达到硬度极大值。The hard reactive( ZrTiAl) N coatings were synthesized by multi arc ion plating on substrate of high speed steel. The influence of the content ratio of Zr,Ti and Al metal nitrides on the microstructures and surface hardness of( ZrTiAl) N coatings was investigated with X-ray diffraction,scanning electron microscopy,energy dispersive spectroscopy( EDS) and harness tester. The results show that the content ratio of Zr N,Ti N and Al N has a minor impact. For instance,weakly affected by a rather large changes in the metal nitrides content ratio,the as-deposited( ZrTiAl) N coatings,a solid solution type with fcc-phased grains preferentially grown in 111 orientation,displayed fairly high hardness and the lattice constant followed Vegard's law. When Ti N and Al N contents in( ZrTiAl) N coatings were as large as possible and nearly equal,the maximum hardness could be obtained.
关 键 词:(ZrTiAl)N 硬质反应膜 硬度 相组成 组元配比
分 类 号:TG174[金属学及工艺—金属表面处理]
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