酸性蚀刻液中2-巯基苯并噻唑的缓蚀性研究  

Corrosion inhibition of 2-mercaptobenzothiazole in acid etching solution

作　　者：李高升 陈苑明[1] 何为[1] 艾克华 李清华 王青云 李长生 Li Gaoshen;Chen Yiming;He Wei

机构地区：[1]电子科技大学微电子与固体电子学院,四川成都610054 [2]四川英创力电子科技股份有限公司,四川遂宁629000 [3]四川省华兴宇电子科技有限公司,四川什邡618400

出　　处：《印制电路信息》2018年第A02期63-69,共7页Printed Circuit Information

摘　　要：将2-巯基苯并噻唑加入酸性氯化铜蚀刻液。研究其与2-苯氧基乙醇协同缓蚀的效果，并通过电化学方法表征铜蚀刻过程的电流变化。实验结果表明．2-巯基苯并噻唑吸附规律符合朗格缪尔吸附等温式。能够增大传递电阻并减小腐蚀电流。2-巯基苯并噻唑与2-苯氧基乙醇的相互协同作用可促进铜表面吸附效果，并进一步增大传递电阻减小腐蚀电流。加入润湿剂2-苯氧基乙醇能够明显减小该蚀刻溶液在铜面的接触角。应用该酸性氯化铜蚀刻液．铜线路的蚀刻因子增大到2．52。2-Mercaptobenzothiazole and 2-Phenoxyethanol were added into me etching somuon with acidic copper chloride to form a synergistic effect for corrosion inhibition. The current change during copper etching was measured by electrochemical method. The results revealed that the adsorption behavior of 2-Mercaptobenzothiazole matched Langmuir isotherm equation andincrease transfer resistance and led to the decrease of corrosion current. In addition,2-Mercaptobenzothiazole and 2-Phenoxyethanol for mutual synergistic effect could promote the adsorptionon copper surface, thereby further increasing transfer resistance and decreasing the corrosion current. Adding the wetting agent 2-Phenoxyethanol can significantly reduce the contact angle of the etching solution on the copper surface. Etching factor for copper lines could be increased to 2.52 when using above etching solution.

关 键 词：吸附 协同作用 传递电阻 腐蚀电流 接触角 铜线路 

分 类 号：TN41[电子电信—微电子学与固体电子学]