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作 者:李宏战 马幼平[1] 李争显[2] 杜继红[2] 王毅飞[2] 李少龙[2] LI Hongzhan;MA Youping;LI Zhengxian;DU Jihong;WANG Yifei;LI Shaolong(School of Metallurgic Engineering,Xi'an University of Architecture and Technology,Xi'an 710055,China;Northwest Institute for Nonferrous Metal Research,Xi'an 710016,China)
机构地区:[1]西安建筑科技大学冶金工程学院,西安710055 [2]西北有色金属研究院,西安710016
出 处:《腐蚀与防护》2018年第11期883-887,共5页Corrosion & Protection
基 金:国家重点基础研究发展计划(973计划)(2012CB625102);陕西省自然科学基础研究计划(2014JM2-5061)
摘 要:在硅酸钠电解液体系中,采用不同工艺在ZL205A铝合金表面制备微弧氧化层。通过测厚仪、扫描电镜、X射线衍射仪等研究了氧化电压和氧化时间对膜层性能的影响。结果表明:氧化膜主要由α-Al_2O_3、Mullite(Al_6Si_2O_(13))、Al相及非晶相组成;氧化层的放电通道孔径尺寸随氧化电压、时间的增加不断增大;随着氧化电压、时间的增加,氧化层厚度呈线性增长;氧化膜距离基体50μm处的硬度(1 358 HV)高于距离基体200μm处的(1 176HV)。通过工艺条件调整可有效改善ZL205A铝合金微弧氧化层的膜层结构及性能。A micro-arc oxidation layer on ZL205A aluminum alloy was prepared in sodium silicate electrolyte system with different technologies. The effects of oxidation voltage and oxidation time on the properties of the film were investigated by means of thickness gauge, scanning electron microscope (SEM), X-ray diffractometer and so on. The results showed that the oxide film was mainly composed of α-Al2O3, Mullite (Al6Si2O13 ), Al phase and amorphous phase. The pore size of the discharge channel of the oxide layer increased with the increase of oxidation voltage and time; as the oxidation voltage and time increased, the thickness of the oxide layer increased linearly. The hardness of the oxide film at a distance of 50μm from the substrate (1 358 HV) was higher than that at 200 μm from the substrate (1 176 HV). The film structure and properties of the micro-arc oxidation layer of ZL205A aluminum alloy can be effectively improved by adjusting the process conditions.
分 类 号:TG147[一般工业技术—材料科学与工程]
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